[1 ] B. Jaffe, W.R. Cook, J.R. Jaffe and H. Jaffe: Piezoelectric Ceramics, Academic Press, New York, 1971.[2 ] G.Z. Zang, J.F. Wang, H.C. Chen, W.B. Su, C.M. Wang, P. Qi, B.Q. Ming, J. Du, L.M. Zheng, S. Zhang and T.R. Shrout: Appl. Phys. Lett., 2006, 88, 212908.[3 ] EU-Directive 2002/96/EC: Waste Electrical and Electronic Equipment (WEEE), Off. J. Eur. Union, 2003, 46 (L37), 24.[4 ] EU-Directive 2002/95/EC: Restriction of the Use of Certain Hazardous Substances in Electrical and Electronic Equipment (RoHS), Off. J. Eur. Union, 2003,46(L37), 19.[5 ] Y. Guo, K. Kakimoto and H. Ohsato: Appl. Phys. Lett., 2004, 85, 4121.[6 ] K. Shibata, F. Oka, A. Ohisi, T. Mishima and I. Kanno: Appl. Phys. Express, 2008, 1, 011501.[7 ] Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya and M. Nakamura: Nature, 2004, 432, 84.[8 ] C.W. Ahn, E.D. Jeong, S.Y. Lee, H.J. Lee, S.H. Kang and I.W. Kim: Appl. Phys. Lett., 2008, 93, 212905.[9 ] Y. Kizaki, Y. Noguchi and M. Miyayama: Appl. Phys. Lett., 2006, 89, 142910.[10] G. Shirane, R. Newnham and R. Pepinsky: Phys. Rev., 1954, 96, 581.[11] S. Tashiro, H. Nagamatzu and K. Nagata: Jpn. J. Appl. Phys., 2002, 41, 7113.[12] Y. Nakashima, W. Sakamoto, T. Shimura and T. Yogo: Jpn. J. Appl. Phys., 2007, 46, 6971.[13] M. Blomqvist, J.H. Koh, S. Khartsev, A. Grishin and J. Andreasson: Appl. Phys. Lett., 2002, 81, 337.[14] C.R. Cho and A. Grishin: J. Appl. Phys., 2000, 87, 4439.[15] F. Söderlind, P.O. Käll and U. Helmersson: J. Cryst. Growth, 2005, 281, 468.[16] K. Tanaka, K. Kakimoto and H. Ohsato: J. Cryst. Growth, 2006, 294, 209.[17] W. Sakamoto, Y. Mizutani, N. Iizawa, T. Yogo, T. Hayashi and S. Hirano: J. Eur. Ceram. Soc., 2005, 25, 2305.[18] W. Sakamoto, Y. Mizutani, N. Iizawa, T. Yogo, T. Hayashi and S. Hirano: J. Electroceram., 2006, 17, 293.[19] X. Yan, W. Ren, X. Wu, P. Shi and X. Yao: J. Alloy. Compd., 2010, 508, 129.[20] D.D. Liu and J.P. Mevissen: Integr. Ferroelectr., 2006, 18, 263.[21] Y. Tu, M.L. Calzada, N.J. Phillips and S.J. Milane: J. Am. Ceram. Soc., 1996, 79(2), 441.[22] L. Wang, K. Yao and W. Ren: Appl. Phys. Lett., 2008, 93, 092903.[23] C.W. Ahn, S.Y. Lee, A. Ullah, J.S. Bae, E.D. Jeong, J.S. Choi, B.H. Park and I.W. Kim: J. Phys. D-Appl. Phys., 2009, 42, 215304.[24] K. Tanaka, H. Hayashi, K. Kakimoto, H. Ohsato and T. Iijima: Jpn. J. Appl. Phys., 2007, 46, 6964.[25] Y. Nakashima, W. Sakamoto, T. Shimura and T. Yogo: Jpn. J. Appl. Phys., 2007, 46, 6971. |