Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Molybdenum Oxysulphide Thin Films

Abstract

Abstract:

Molybdenum oxodithiocarbamate was prepared as a single solid source precursor for molybdenum oxysulphide thin films which were deposited on sodalime glass substrates using metal organic chemical vapour deposition (MOCVD) technique at a temperature of 420°C. Rutherford backscattering spectroscopy (RBS) was used to determine the elemental composition of the film which showed that the films contained large amounts of oxygen. The large amount of oxygen was attributed to the large abundance of oxygen in the starting material. A direct optical energy gap of 3.31 eV was obtained from the analysis of the absorption spectrum. The scanning electron microscopy (SEM) micrographs of the films showed that the films were continuous and porous. An estimated average size of the grains was below 5 μm. X-ray diffraction (XRD) showed that the deposited films were crystalline in nature.

Key words: Molybdenum oxodithiocarbamate, Molybdenum oxysulphide, Metal organic chemical vapour deposition (MOCVD), Thin film

B. Olofinjana G.O. Egharevba M.A. Eleruja C. Jeynes A.V. Adedeji O.O. Akinwunmi B.A. Taleatu C.U. Mordi E.O.B. Ajayi. Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Molybdenum Oxysulphide Thin Films[J]. J Mater Sci Technol, 2010, 26(6): 552-557.

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