[1 ] S.M. Park, T. Ikegami and K. Ebihara: Jpn. J. Appl. Phys., 2006, 45, 8453.[2 ] H. Ohta and H. Hosono: Mater. Today, 2004, 7, 42. [3 ] S.M. Park, T. Ikegami and K. Ebihara: Jpn. J. Appl. Phys., 2005, 44, 8027.[4 ] S. Suzuki, T. Miyata, M. Ishii and T. Minami: Thin Solid Films, 2003, 434, 14.[5 ] C. Liu, Y. Masuda, Y. Wu and O. Taki: Thin Solid Films, 2006, 503, 110.[6 ] J. Zhao, L. Hu, Z. Wang, J. Sun and Z. Wang: Appl. Surf. Sci., 2006, 253, 841.[7 ] Y.W. Heo, K. Ip, S.J. Park, S.J. Pearton and D.P. Norton: Appl. Phys. A, 2004, 78, 53.[8 ] T. Soki, Y. Hatanaka and D.C. Look: Appl. Phys. Lett., 2000, 76, 3257.[9 ] Y. Liu, C.R. Gorla, S. Liang, N. Emanetoglu, Y. Lu, H. Shen and M. Wraback: J. Electron. Mater., 2000, 29, 60.[10] D.C. Raynold, D.C. Look and B. Jogai: Solid State Commun., 1996, 99, 873.[11] V.R. Shinde, T.P. Gujar, C.D. Lokhande, R.S. Mane and S.H. Han: J. Cryst. Growth, 2006, 296, 6.[12] H. Ohno: Science, 1998, 281, 951.[13] L.K. Singh and H. Mohan: J. Pure Appl. Phys., 1975, 13, 486.[14] F.K. Shan, B.I. Kim, G.X. Liu, Z.F. Liu, J.Y. Sohn, W.J. Lee, B.C. Shin and Y.S. Yu: J. Appl. Phys., 2004, 95, 4772.[15] Z.Q. Xu, H. Deng, J. Xie, Y. Li and X.T. Zu: Appl. Surf. Sci., 2006, 253, 476.[16] J. Mass, P. Bhattachariya and R.S. Katiyar: Mater. Sci. Eng. B, 2003, 103, 9.[17] Q.P. Wang, D.H. Zhang, Z.Y. Xue and X.T. Haso: Appl. Surf. Sci., 2002, 201,123.[18] J. Zhang, W. Yu and L. Zhang: Phys. Lett. A, 2002, 299, 276.[19] Y. Kashiwaba, K. Sugawara and K. Haga: Thin Solid Films, 2002, 411, 87.[20] H. Kato, M. Sano, K. Miyamoto and T. Yao: J. Cryst. Growth, 2002, 237{239,538.[21] M. Haase, H. Weller and A. Henglin: J. Phys. Chem., 1998, 92, 482.[22] X.J. Yin, G.R. Lai, J.S. Chen and J.S. Kao: Surf. Coat. Technol., 1997, 96, 239.[23] M.D. Olvera, A. Maldonado, R. Asomoza and M. Melendez-Lira: Sol. Energy Mater. Sol. Cells, 2002, 71, 61.[24] M.K.R. Khan, M.A. Rahman, M. Shahjahan, M.M. Rahman, M.A. Hakim, D.K. Saha, J.U. Khan: Curr. Appl. Phys., 2010, 10, 790.[25] B.D. Cullity: Elements of X-ray di®raction, AddisonWesley Publishing Co. Inc., New York, 1967, 262.[26] M.J. Alam and D.C. Cameron: J. Sol-Gel Sci. Technol., 2002, 25, 137.[27] D. Goyal, P. Solanki, B. Marathe, M. Takawale and V. Bhide: Jpn. J. Appl. Phys., 1992, 31, 61.[28] D. Cossement and J.M. Streydio: J. Cryst. Growth, 1985, 72, 57.[29] N.F. Mott and E.A. Davis: Electronic Processes in Non-crystalline Materials, 2nd edn, Clarendon Press, Oxford, 1979, 240.[30] S. Shishiyanu, L. Chow, O. Lupan and T. Shishiyanu: ECS Trans., 2006, 3, 65.[31] X.P. Li, B.L. Zhang, H.C. Zhu, X. Dong, X.C. Xia, Y.G. Cui, Y. Ma and G.T. Du: J. Phys. D-Appl. Phys., 2008, 41, 035101.[32] W.I. Park and G.C. Yi: J. Electron. Matter., 2001, 30, L32.[33] F. Mikrajuddin, K. Iskander, F. Okutama and G. Sji: J. Appl. Phys., 2001, 89, 6431.[34] E.G. Bylander: J. Appl. Phys., 1978, 49, 1188.[35] A.F. Kohan, G. Ceder, D. Morgan and C.G. Van de Walle: Phys. Rev. B, 2000, 61, 15019. |