| [1] T.C.Halsey: Science, 1992, 258, 761. [2] W.M.Winslow: US Patent, 2417850, 1947.
 [3] T.Hao, A.Kawai and F.Ikazaki: Langmuir, 1998, 14(5), 1256.
 [4] G.Y.Liu, Y.L.Zhang, X.M.Feng, J.K.Liang and G.H.Rao: J. Alloy. Compd.,2003, 351(1-2), 295.
 [5] H.Bose and A.Trendler: Int. J. Mod. Phys. B, 2002, 16(17-18), 2751.
 [6] Y.L.Zhang, Y.Ma, J.K.Liang, G.G.Rao and K.Q.Lu: Mod. Phys. Lett. B, 1998, 12(4), 155.
 [7] X.P.Zhao, J.B.Yin, L.Q.Xiang and Q.Zhao: Int. J. Mod. Phys. B, 2002, 16(17-18), 2371.
 [8] X.P.Zhao, J.B.Yin, L.Q.Xiang and Q.Zhao: J. Mater. Sci., 2002, 37(12), 2569.
 [9] J.B.Yin, L.T.Guan and X.P.Zhao: Prog. Nat. Sci., 2002, 12(4), 278.
 [10] J.B.Yin and X.P.Zhao: Chem. Mater., 2004, 16, 321.
 [11] J.B.Yin and X.P.Zhao: J. Mater. Chem., 2003, 13, 689.
 [12] J.B.Yin and X.P.Zhao: Chem. Mater., 2002, 14, 4633.
 [13] J.B.Yin and X.P.Zhao: Chem. Mater., 2002,14, 2258.
 [14] L.Q.Xiang and X.P.Zhao: J. Mater. Chem., 2003, 13, 1529.
 [15] Xiaopeng ZHAO, Jianbo YIN and Liqin XIANG: Chin. J. Mater. Res., 2001, 15(3), 308. (in Chinese)
 [16] B.X.Wang and X.P.Zhao: J. Mater. Chem., 2003, 13(9), 2248.
 [17] S.Z.Ma, F.H.Liao, S.X.Li, M.Y.Xu, J.R.Li, S.H.Zhang, S.M.Chen and S.Gao: J. Mater. Chem., 2003, 13, 3096.
 [18] Q.Wu, B.Y.Zhao, L.S.Chen and K.A.Hu: Scripta Mater., 2004, 50, 635.
 [19] T.Hao: Adv. Colloid Interface Sci., 2002, 97, 1.
 [20] T.Hao, Z.M.Xu and Y.Z.Xu: J. Colloid Interface Sci., 1997, 190(2), 334.
 [21] Chenguan WEI: Electrorheological Technology-Theory Material Engineering Applications, Beijing Institute of Technology Press, Beijing, 2000, 254-258. (in Chinese)
 [22] J.B.Jun, S.Y.Uhm, S.H.Cho and K.D.Suh: Langmuir, 2004, 20, 2429.
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