[1 ] G.D.Wilk, R.M.Wallace and J.M.Anthony: J. Appl. Phys., 2001, 89, 5243. [2 ] S.Stemmer, Z.Chen and R.Keding: J. Appl. Phys., 2002, 92, 82. [3 ] M.Houssa, J.L.Autran, A.Stesmans and M.M.Heyns: Appl. Pbys. Lett., 2002, 81, 709. [4 ] Y.Z.Hu and S.P.Tay: J. Vac. Sci. Technol. B, 2001, 19, 1706. [5 ] A.Duparre, E.Welsch, H.G.Walter, N.Kaiser, H.Mueller, E.Hacker, H.Lauth, J.Meyer and P.Weissbrodt: Thin Solid Films, 1994, 250, 1. [6 ] E.T.Kim and S.G.Yoon: Thin Solid Films, 1993, 227, 7. [7 ] Krishnan Balachander, Subramaniam Arulkumaran, Hiroyasu Ishikawa, Krishnan Baskar and Takashi Egawa: Phys. Stattus. Solidi. A, 2005, 202(2), 16. [8 ] M.Wang and C.Y.Chen: Appl. Phys. Lett., 1991, 58, 304. [9 ] M.Garcia-Hipolito, E.Martinez, O.Alvarez-Fregoso, C.Falcony and M.A.Aguilar-Frutis: J. Mater. Sci. Lett., 2001, 20, 1799. [10] J.Okabayashi, S.Toyoda, H.Kumigashira, M.Oshima, K.Usuda, M.Niwa and G.L.Liu: Appl. Phys. Lett., 2004, 85, 5959. [11] S.M.Sze: Physics of Semiconductor Devices, 2nd Ed., Wiley, New York, 1981.! |