J. Mater. Sci. Technol. ›› 2023, Vol. 148: 199-208.DOI: 10.1016/j.jmst.2022.11.025

• Research article • Previous Articles     Next Articles

Schottky barrier modulation of bottom contact SnO2 thin-film transistors via chloride-based combustion synthesis

Bongho Janga, Junhee Leea, Hongki Kanga, Jaewon Jangb,c, Hyuk-Jun Kwona,d,*   

  1. aDepartment of Electrical Engineering and Computer Science, DGIST, Daegu 42988, South Korea;
    bSchool of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, South Korea;
    cSchool of Electronics Engineering, Kyungpook National University, Daegu 41566, South Korea;
    dConvergence Research Advanced Centre for Olfaction, DGIST, Daegu 42988, South Korea
  • Received:2022-06-27 Revised:2022-10-05 Accepted:2022-11-20 Published:2023-06-10 Online:2023-06-05
  • Contact: *E-mail address:. hj.kwon@dgist.ac.kr (H.-J. Kwon)

Abstract: The enhanced carrier flow at the interface between Au and SnO2 semiconductors, which initially form Schottky contacts, is realized using chloride-based combustion synthesis. Chloride-based combustion systems can achieve chlorine (Cl) doping effects as well as conversion to crystalline SnO2 films at clearly lower temperatures (∼250 °C) than conventional precursors. Due to the Cl doping effect, the high carrier concentration can induce thin potential barriers at the metal/semiconductor (MS) junctions, resulting in carrier injection by tunneling. As a result, compared to conventional SnO2 thin-film transistors, the devices fabricated by combustion synthesis exhibit significantly improved electrical performance with field-effect mobility of 6.52 cm; 2/Vs (∼13 times), subthreshold swing of 0.74 V/dec, and on/off ratio of ∼10; 7 below 300 °C. Furthermore, because of the enhanced tunneling carriers induced by the narrowed barrier width, the Schottky barriers are significantly reduced from 0.83 to 0.29 eV (65% decrease) at 250 °C and from 0.42 to 0.17 eV (60% decrease) at 400 °C. Therefore, chloride-based combustion synthesis can contribute to developing SnO2-based electronics and flexible devices by achieving both high-quality oxide films and improved current flow at the MS interface with low-temperature annealing.

Key words: SnO2, Combustion, Sol-gel, Schottky contact, Thin-film transistors