J. Mater. Sci. Technol. ›› 2015, Vol. 31 ›› Issue (12): 1198-1206.DOI: 10.1016/j.jmst.2015.10.016

• Orginal Article • Previous Articles     Next Articles

Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH = 2)

Bin Zhang1, 2, Li Liu2, Tianshu Li2, Ying Li2, Mingkai Lei1, Fuhui Wang2   

  1. 1 Surface Engineering Laboratory, Department of Materials Science and Engineering, Dalian University of Technology, Dalian 116023, China;
    2 Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
  • Received:2015-02-11 Revised:2015-03-13 Online:2015-12-19
  • Contact: Prof., Ph.D.; Tel.: +86 24 23925323; Fax: +86 24 23925323. (L. Liu). E-mail address: liliu@imr.ac.cn (L. Liu).
  • Supported by:
    The authors are grateful to Dr. D. Chen, Solid Atomic Imaging Division, Institute of Metal Research, for providing computational resources and helpful discussion. The investigation is supported by the National Basic Research Program of China (No.2014CB643303), and the National Natural Science Foundation of China (Nos. 50801063and 51271187).

Abstract: The adsorption and diffusion behavior of Cl- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl + NaCl solution (pH = 2, [Cl-]=0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Φsof NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.

Key words: Nanocrystalline, Cl- adsorption, XPS (X-ray photoelectron spectroscopy), First principles calculations