Nanostructured Ti29.7Ni50.3Hf20 high temperature shape memory alloy processed by high-pressure torsion

doi:10.1016/j.jmst.2020.01.065

Abstract

Abstract:

High-pressure torsion (HPT) processing under a pressure of 6.0 GPa was applied to Ti_29.7Ni_50.3Hf₂₀ (at.%) alloy. Two types of structure were observed after HPT with 3 revolutions: first one is the mixture of amorphous phase and retained nanocrystalline; second is the alternating bands of amorphous phase and high defect density crystalline. As a result, post deformation annealing (PDA) at 500-700 °C leads to the non-uniform distribution of martensite and parent phase grains. The grains of martensite are twice larger compared to that of parent phase. The nanocrystalline and ultrafine grains form after annealing at 500-600 °C and 700 °C, respectively. The twinning mechanism does not change with the reduction of martensitic grains up to ～35 nm. The relationship between strength and grain size in Ti_29.7Ni_50.3Hf₂₀ alloy obeys the classical Hall-Petch relationship with a coefficient of 10.80 ± 0.39 GPa nm ^1/2.

Key words: TiNiHf, Nanocrystalline alloy, Amorphous structure, High-pressure torsion, Hall-Petch relationship

A. Shuitcev, D.V. Gunderov, B. Sun, L. Li, R.Z. Valiev, Y.X. Tong. Nanostructured Ti_29.7Ni_50.3Hf₂₀ high temperature shape memory alloy processed by high-pressure torsion[J]. J. Mater. Sci. Technol., 2020, 52: 218-225.

Figures/Tables 10

Table 1 Degree of true strain, shear deformation and its equivalent at the edges (r) and at the half-radius (r/2) of Ti29.7Ni50.3Hf20 samples processed by HPT.

Number of revolutions, N	Sample thickness, mm	True strain e		Shear deformation γ		Equivalent shear deformation γeq
Number of revolutions, N	Sample thickness, mm	r	r/2	r	r/2	r	r/2
0.5	0.72	3.77	3.08	43.61	21.81	25.18	12.59
1	0.70	4.50	3.80	89.71	44.86	51.80	25.90
3	0.52	5.89	5.20	362.31	181.15	209.18	104.6

Table 2 Microhardness of Ti29.7Ni50.3Hf20 samples at initial and deformed states.

Number of revolutions, N	Microhardness H_v, GPa
Number of revolutions, N	center	half radius	edge
0^a	3.81 ± 0.05
0.5	5.86 ± 0.10	6.38 ± 0.12	6.45 ± 0.08
1	5.79 ± 0.07	6.07 ± 0.08	6.36 ± 0.07
3	6.11 ± 0.10	6.16 ± 0.10	6.29 ± 0.09

Fig. 1. XRD patterns of differently treated Ti29.7Ni50.3Hf20 alloy. The inset is a half-width of (110)B2 XRD peak vs. number of revolutions N.

Fig. 2. TEM bright field images of the solution-treated Ti29.7Ni50.3Hf20 alloy showing martensitic variants (a) and inner twins (c) (the SAED pattern (b) was taken from the interface marked by circle in (a).) and microstructure of HPT-processed Ti29.7Ni50.3Hf20 alloy with N = 3 (d). The SAED pattern (e), dark field image (f) and high resolution image (g) were taken from the area of (d). The TEM sample was cut from the near-edge area of HPT-processed specimen.

Fig. 3. TEM bright field image of the band structure in the HPT-processed Ti29.7Ni50.3Hf20 alloy with N = 3. The SAED patterns (b), (c) and (d) were taken from the areas marked by circles in (a). The TEM sample was cut from the near-edge area of HPT-processed specimen.

Fig. 4. DSC curves upon heating of HPT-processed Ti29.7Ni50.3Hf20 alloy with different revolutions numbers (a) and correlation between ΔH and revolution number (b).

Fig. 5. TEM bright field images of HPT-processed Ti29.7Ni50.3Hf20 alloy after isothermal annealing at 500 (a, b), 600 (c, d) and 700 °C (e, f). The SAED patterns were inserted. Parent phase and martensite are marked by “P” and “M”, respectively.

Fig. 6. Histograms of the grain size distributions of parent phase and martensite in Ti29.7Ni50.3Hf20 alloy after annealing at 500 (a), 600 (b) and 700 °C (c).

Fig. 7. TEM bright field (a,b), high resolution TEM (c) image and FFT pattern (d) obtained from the HPT-processed Ti29.7Ni50.3Hf20 alloy annealed at 500 °C. The FFT pattern (d) was taken from area marked by square in (c).

Fig. 8. Hall-Petch relationship showing the measured microhardness of Ti29.7Ni50.3Hf20 alloy after HPT with subsequent annealing as a function of the inverse square-root of grain size.

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Nanostructured Ti_29.7Ni_50.3Hf₂₀ high temperature shape memory alloy processed by high-pressure torsion

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