Effects of Homo-bu®er Layer on Properties of Sputter-deposited ZnO Films

Abstract

Abstract:

Two-step growth regimes were applied to realize a homoepitaxial growth of ZnO films on freestanding diamond substrates by radio-frequency (RF) reactive magnetron sputtering method. ZnO buffer layers were deposited on freestanding diamond substrates at a low sputtering power of 50 W, and then ZnO main layers were prepared
on this buffer layer at a high sputtering power of 150 W. For comparison, a sample was also deposited directly on freestanding diamond substrate at a power of 150 W. The effects of ZnO buffer layers on the structural, optical, electrical and morphological properties of the ZnO main layer were studied by X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, semiconductor characterization system and atomic force microscopy (AFM) respectively. The experimental results suggested that homo-buffer layer was helpful to improve the crystalline quality of ZnO/diamond heteroepitaxial films.

Key words: Freestanding diamond, ZnO film, Buffer layer, Magnetron sputtering

CLC Number:

Jian Huang,Linjun Wang,Run Xu,Weimin Shi,Yiben Xia. Effects of Homo-bu®er Layer on Properties of Sputter-deposited ZnO Films[J]. J Mater Sci Technol, 2009, 25(05): 691-694.

References

[1 ] W. Gao and Z. Li: Ceram. Int., 2004, 30, 1155.
[2 ] Q.A. Xu, J.W. Zhang, K.R. Ju, X.D. Yang and X. Hou: J. Crystal Growth, 2006, 289, 44.
[3 ] C.X. Wang, G.W. Yang, C.X. Gao, H. W. Liu , Y. H. Han , J. F. Luo and G. T. Zou: Carbon, 2004, 42, 317.
[4 ] T. Lamara, M. Belmahi, O. Elmazria, L. L. Brizoual, J. Bougdira, M. Remy and P. Alnot: Diamond Relat. Mater., 2004, 13, 581.
[5 ] J.M. Liu, Y.B. Xia, L.J.Wang, Q.F. Su and W.M. Shi: Appl. Surf. Sci., 2007, 253, 5218.
[6 ] T. Matsuda, M. Furuta, T. Hiramatsu, C. Li, H. Furuta, H. Hokarid and T. Hirao: J. Crystal Growth, 2008, 310, 31.
[7 ] S. Fujihara, C. Sasaki and T. Kimura: Appl. Surf. Sci., 2001, 180, 341.
[8 ] K. Tankala, T. Debroy and M. Alam: J. Mater. Res., 1990, 5, 2483.
[9 ] J. Liu, W.J. Weng, W.H. Ding, K. Cheng, P.Y. Du, G. Shen and G.R. Han: Surf. Coat. Tech., 2005, 198, 274.
[10] A. Vescan, I. Daumiller, P. Gluche, W. Ebert and E. Kohn: Diamond Relat. Mater., 1998, 7, 581.
[11] H. Noda, A. Hokazono and H. Kawarada: Diamond Relat. Mater., 1997, 6, 685.
[12] C.X. Wang, G.W. Yang, T.C. Zhang, H.W. Liu, Y.H. Han, J.F. Luo, C.X. Gao and G.T. Zou: Diamond Relat. Mater., 2003, 12, 1548.
[13] J.M. Liu, Y.B. Xia, L.J.Wang, Q.F. Su and W.M. Shi: J. Crystal Growth, 2007, 300, 353.
[14] M. Yoshikawa, G. Katagiri, H. Ishida, A. Ishitani, M. Ono and K. Matsumura: Appl. Phys. Lett., 1989, 55(25), 2608.
[15] M. Silveira, M. Becucci, E. Castellucci, F.P. Mattiot, V. Barbarossa, R. Tomaciello and F. Galluzzi: Diamond Relat. Mater., 1993, 9, 1257.
[16] J.M. Calleja and M. Cardona: Phys. Rev. B, 1977, 16, 3753.
[17] K.A. Alim, V.A. Fonoberov and A.A. Balandin: Appl. Phys. Lett., 2005, 86, 053103.
[18] S. Cho, J. Ma, Y. Kim, Y. Sun, G.K.L. Wong and J.B. Ketterson: Appl. Phys. Lett., 1999, 75(18), 2761.
[19] S.A. Studenikin, N. Golego and M. Cocivera: J. Appl. Phys., 1998, 84(4), 2287.
[20] K. Vanheusden, W.L. Warren, C.H. Seager, D.R. Tallant, J.A. Voigt and B.E. Gnade: J. Appl. Phys., 1996, 79(10), 7983.
[21] L. Spanhel and M.A. Anderson: J. Am. Chem. Soc., 1991, 113, 2826.

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