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J Mater Sci Technol  2009, Vol. 25 Issue (03): 336-340    DOI:
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Microstructure of Epitaxial La0.7Ca0.3MnO3 Thin Films Deposited by Direct Current Magnetron Sputtering on LaAlO3 Substrate
Mingguang Wang, Hengqiang Ye
1) Department of Sciences, Northeastern University, Shenyang 110004, China
2) Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
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Transmission electron microscopy (TEM) and high resolution electron microscopy (HREM) have been used to study the microstructural properties of La0.7Ca0.3MnO3 films on (001) LaAlO3 substrates prepared by direct current magnetron sputtering technique. The as-grown thin films with different thickness are perfectly coherent with the substrates. The film suffers a tetragonal deformation in the area near the interface between the film and the substrate. With increasing thickness, the film is partially relaxed. It was found that La0.7Ca0.3MnO3 films consist of two types of oriented domains described as: (1) (110)f [001]f||(001)s[100]s and (1¹10)f [001]f||(001)s[100]s and (2) (110)f [001]f||(001)s[010]s and (1¹10)f [001]f//(001)s[010]s. Upon annealing, the film is relaxed by the formation of mis¯t dislocations. Other than mis¯t dislocations, two types of threading dislocations with Burgers vector of <100> and <110> were also identified.

Key words:  Colossal magnetoresistance      Microstructure      Film      Dislocation     
Received:  17 January 2008     

y the National Natural Science Foundation of China under Grant 50572013

Corresponding Authors:  wang mingguang     E-mail:

Cite this article: 

Mingguang Wang,Hengqiang Ye. Microstructure of Epitaxial La0.7Ca0.3MnO3 Thin Films Deposited by Direct Current Magnetron Sputtering on LaAlO3 Substrate. J Mater Sci Technol, 2009, 25(03): 336-340.

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