[1 ] W.H. Chuang, K.F. Rainer and G. Reza: Sensor. Actuat. A-Phys., 2005, 121(2), 557.
[2 ] X.D. Li and B. Bharat: Surf. Coat. Technol., 2003, 163-164, 521.
[3 ] C.W. Baek, Y.K. Kim, Y. Ahn and Y.H. Kim: Sensor. Actuat. A-Phys., 2005, 117(1), 17.
[4 ] S. Sriram and B. Bharat: Sensor. Actuat. A-Phys., 2002, 101(3), 338.
[5 ] G.P. Zhang, K. Takashima, M. Shimojo and Y. Higo: Mater. Lett., 2003, 57, 1555.
[6 ] A.P. Jivkov: Theor. Appl. Fract. Mec., 2003, 40(1), 45.
[7 ] C.L. Muhlstein, S.B. Brown and R.O. Ritchie: J. Microelectromech. S., 2001, 11(4), 593.
[8 ] C.L. Muhlstein, E.A. Stach and R.O. Ritchie: Appl. Phys. Lett., 2002, 80(9), 1532.
[9 ] N.V. Lavrik, M.J. Sepaniak and P.G. Datskos: Rev. Sci. Instrum., 2004, 75(7), 2229.
[10] R. Berger, C. Gerber, J.K. Gimzewski, E. Meyer and H.J. Guntherodt: Appl. Phys. Lett., 1996, 69(1), 40.
[11] S.M. Spearing: Acta Mater., 2000, 48(1), 179.
[12] K. Takashima, Y. Higo, S. Sugiura and M. Shimojo: Mater. Trans., 2001, 42(1), 68.
[13] M. Diener and C. Kowanda: Mater. Manuf. Process., 2004, 19(1), 111.
[14] J. Peirs, D. Reynaerts and F. Verplaetsen: Sensor. Actuat. A-Phys., 2004, 113(1), 86.
[15] X. Liu, D. Du and G. Mourou: J. Quantum. Elect., 1997, 33(10), 1706.
[16] A. Borowiec and H.K. Haugen: Appl. Phys. A-Mater., 2004, 79(3), 521.
[17] H. Dachraoui and W. Husinsky: Appl. Phys. Lett., 2006, 89(10), 104102.
[18] X.D. Li and B. Bhushan: Scripta Mater., 2002, 47(7), 473.
[19] J.W. Schultze and V. Tsakova: Electrochim. Acta, 1999, 44(21-22), 3605.
[20] J.W. Schultze and A. Bressel: Electrochim. Acta, 2001, 47(1), 3.
[21] J. Heinze: Angew. Chem. Int. Edit., 1993, 32(9), 1268.
[22] J.H. Xie, A.T. Alpas and D. Northwood: Mater. Character., 2002, 48(4), 271.
[23] K. Tokaji, H.N. Ko, M. Nakajima and H. Ltoga: Mater. Sci. Eng. A, 2003, 345(2), 197.
[24] G.P. Zhang, K.Takashima and Y. Higo: Mater. Sci. Eng. A, 2006, 426(1), 96.
[25] X. Li, B. Bhushan: Mater. Charact., 2002, 48, 11. |