J. Mater. Sci. Technol. ›› 2021, Vol. 76: 150-155.DOI: 10.1016/j.jmst.2020.11.006
• Letter • Previous Articles Next Articles
Huabei Peng*(), Dian Wang, Qi Liao, Yuhua Wen**(
)
Received:
2020-05-29
Published:
2020-11-06
Online:
2020-11-06
Contact:
Huabei Peng,Yuhua Wen
About author:
**wenyh@scu.edu.cn (Y. Wen).Huabei Peng, Dian Wang, Qi Liao, Yuhua Wen. Degeneration and rejuvenation of shape memory effect associated with the precipitation of coherent nano-particles in a Co-Ni-Si shape memory alloy[J]. J. Mater. Sci. Technol., 2021, 76: 150-155.
Fig. 1. (a) TEM micrograph and diffraction pattern of solution treated Co-20Ni-6Si alloy; (b) TEM micrographs and diffraction pattern of solution treated Co-20Ni-6Si alloy subjected to annealing at 873 K for 1 min as well as the corresponding dark-field image of (010)L12; (c) TEM micrograph and diffraction pattern of solution treated Co-20Ni-6Si alloy subjected to annealing at 1073 K for 1 min; (d) DTA curves of solution treated Co-20Ni-6Si alloy subjected to annealing 873 K for 120 min.
Heat treatment | Stacking fault probability | Dislocation density (m-2) |
---|---|---|
Solution treatment | 0.0146 | 0.82 × 1015 |
873 K × 1 min | 0.0083 | 16.31 × 1015 |
1073 K × 1 min | 0.0177 | 1.06 × 1015 |
Table 1 Stacking fault probabilities and dislocation densities of solution-treated Co-20Ni-6Si alloy before and after annealing at 873 K and 1073 K, respectively, for 1 min.
Heat treatment | Stacking fault probability | Dislocation density (m-2) |
---|---|---|
Solution treatment | 0.0146 | 0.82 × 1015 |
873 K × 1 min | 0.0083 | 16.31 × 1015 |
1073 K × 1 min | 0.0177 | 1.06 × 1015 |
Fig. 2. Shape memory properties of solution treated Co-20Ni-6Si alloy before and after annealing at different temperatures for 1 min: (a) effect of annealing temperatures on shape recovery ratio when the bending strain was 5.6 %; (b) recovery strain as a function of deformation strain after annealing at 1073 K for 1 min by contrast with solution treatment.
Fig. 3. Deformation temperature dependence of 0.2 % proof-stress for solution treated Co-20Ni-6Si alloy before and after annealing at 873 K and 1073 K, respectively, for 1 min.
Fig. 4. Backscattered electron images of solution treated Co-20Ni-6Si alloy and one subjected to annealing at 873 K and 1073 K, respectively, for 1 min before and after 5.6 % deformation at room temperature.
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