J. Mater. Sci. Technol. ›› 2019, Vol. 35 ›› Issue (5): 727-732.DOI: 10.1016/j.jmst.2018.11.002
• Orginal Article • Previous Articles Next Articles
Minjie Xua, Chao Hua, Haiyan Xianga, Haozi Lua, Travis Shihao Hub, Bonian Huc?(), Song Liua?(
), Gang Yua?(
)
Received:
2018-04-22
Accepted:
2018-07-19
Online:
2019-05-10
Published:
2019-02-20
Contact:
Hu Bonian,Liu Song,Yu Gang
About author:
1 These authors contribute equally to this paper.
Minjie Xu, Chao Hu, Haiyan Xiang, Haozi Lu, Travis Shihao Hu, Bonian Hu, Song Liu, Gang Yu. Controllable phase transformation and improved thermal stability of nickel on tungsten substrate by electrodeposition[J]. J. Mater. Sci. Technol., 2019, 35(5): 727-732.
Process steps | Process solutions and operation conditions |
---|---|
Alkaline cleaning | cleaning with 100 g?L-1 NaOH aqueous solution under ultrasonic environment |
Acid activating | activating with 20% HNO3 aqueous solution under ultrasonic environment |
Table 1 Pretreatment process of tungsten (W) powders.
Process steps | Process solutions and operation conditions |
---|---|
Alkaline cleaning | cleaning with 100 g?L-1 NaOH aqueous solution under ultrasonic environment |
Acid activating | activating with 20% HNO3 aqueous solution under ultrasonic environment |
Components | Parameters |
---|---|
NiSO4?6H2O | 50?g L-1 |
NaCl | 100?g L-1 |
H3BO3 | 30?g L-1 |
NH4Cl | 30?g L-1 |
Temperature | room temperature |
Stirring speed | 900?rpm |
Electroplating time | 10-30?min |
Table 2 Composition of the nickel (Ni) electroplating bath and the deposition parameters.
Components | Parameters |
---|---|
NiSO4?6H2O | 50?g L-1 |
NaCl | 100?g L-1 |
H3BO3 | 30?g L-1 |
NH4Cl | 30?g L-1 |
Temperature | room temperature |
Stirring speed | 900?rpm |
Electroplating time | 10-30?min |
Fig. 1 Schematic of the formation processes of the Ni layer on W powders through intermittent electrodeposition. Under low-applied voltage Ni assumes amorphous structure, while under high-applied voltage Ni crystalizes.
Fig. 2 SEM images of (a) amorphous Ni on W powders, (b) crystalline Ni on W powders; (c) XRD patterns and (d) EDS patterns of pristine W powders (black line) and W samples after electrodepositied Ni under low (blue line) and high (red line) applied voltages. The inset in the top right corner of (a) shows an enlarged image of amorphous Ni, and the insets of the bottom right corner of (a) and (b) depict the Ni microstructures, respectively.
Fig. 3 (a) TEM image, (b) HRTEM image and (c) SAED image of amorphous Ni; (d) TEM image, (e) HRTEM image, and (f) SAED image of crystal Ni. The inset in the top right corner of (e) shows the interplanar spacing of Ni.
Fig. 4 SEM images of Ni on W powders prepared under the applied voltage of 1.1?V and with the periodic electrodeposition time of (a) 1?min for 10 cycles, (b) 2?min for 10 cycles and (c) 3?min for 10 cycles; (d) XRD patterns and (e) EDS patterns of the Ni on W samples prepared under different electrodeposition time of (a), (b) and (c), respectively.
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