[1]T.Liu,D.Kim,D.Leung,M.A.Korhonen and C.Y.Li: Scripta Mater.,1996,35,65. [2]S.Bader,W.Gust and H.Hieber:Acta Metall.Mater., 1995,43,329. [3]J.W.Yoon,S.W.Kim and S.B.Jung:J.Alloy.Compd., 2004,385,192. [4]H.K.Kim and K.N.Tu:Appl.Phys.Lett.,1995,67, 2002. [5]J.W.Yoon and S.B.Jung:Surf.Coat.Technol.,2006, 200,4440. [6]A.Sharif and Y.C.Chan:Mater.Sci.Eng.,2004, 106B,126. [7]J.W.Yoon and S.B.Jung:J.Alloy.Compd.,2005, 396,122. [8]P.L.Liu,Z.Xu and J.K.Shang:Metall.Mater.Trans. A,2000,31,2857. [9]B.L.Young,J.G.Duh and B.S.Chiou:J.Electron. Mater.,2001,30,543. [10]M.He,A.Kumar,P.T.Yeo,G.J.Qi and Z.Chen:Thin Solid Films,2004,462,387. [11]P.L.Liu and J.K.Shang:Metall.Mater.Trans.A, 2000,31,2867. [12]H.E.Biber:J.Electrochem.Soc.,1966,113,362. [13]E.P.Lopez,P.T.Vianco and J.A.Rejent:J.Electron. Mater.,2003,32,254. [14]E.P.Lopez,P.T.Vianco and J.A.Rejent:J.Electron. Mater.,2005,34,299. [15]V.C.Kieling:Surf.Coat.Technol.,1997,96,135. [16]H.Li and F.Ebrahimi:Mater.Sci.Eng.,2003,347A, 93. [17]S.H.Kim,H.J.Sohn,Y.C.Joo,Y.W.Kim,T.H.Yim, H.Y.Lee and T.Kang:Surf.Coat.Technol.,2005, 199,43. [18]P.T.Vianco and J.A.Rejent:J.Electron.Mater.,1999, 28,1138. [19]P.Protsenko,A.Terlain,V.Traskine and N.Eustathopoulos:Scripta Mater.,2001,45,1439. [20]M.C.Oliveira and B.D.Rego:J.Alloy.Compd.,2006, 425,64. [21]C.D.Wagner,A.V.Nanmkin,A.Kraut-Vass, J.W.Allison,C.J.Powell and J.R.Rumble:NIST X-ray Photoelectron Spectroscopy Database,NIST Standard Reference Database 20,Version 3.4(Web version), 2003. [22]T.L.Barr:J.Phys.Chem.,1978,82,1801. [23]M.G.Cook and N.S.Mcintyerr:Anal.Chem.,1975, 47,2208. [24]A.R.Kotan and R.L.Park:Phys.Rev.B,1981,23, 6430. [25]D.Brion:Appl.Surf.Sci.,1980,5,133. [26]S.Masuda,Y.Harada,H.Kato,K.Yagi,T.Komeda, T.Miyano,M.Onchi and Y.Sakisata:Phys.Rev.B, 1988,37,8088. [27]T.Miyano,Y.Sakidata,T.Komeda and M.Onchi:Surf. Sci.,1986,169,197. [28]J.Bielinski and J.Przyluski:Surf.Technol.,1979,9, 65. |