[1 ] D.C. Johnson, J. Feng and L.L. Houk: Electrochim. Acta, 2000, 46, 323.
[2 ] P.D. Yao, X.M. Chen, H. Wu and D.H. Wang: Surf. Coat. Technol., 2008, 202, 3850.
[3 ] G.R.P. Malpass, D.W. Miwa, S.A.S. Machado, P. Olivi and A.J. Motheo: J. Hazard. Mater., 2006, 137, 565.
[4 ] X. Chen, Y. Yang and M. Ding: Anal. Chim. Acta, 2006, 557, 52.
[5 ] C. Bock, A. Smith and B. MacDougall: Electrochim. Acta, 2002, 48, 57.
[6 ] R.C. Xiong, C.G. Jia and G. Wei: J. Beijing Univ. Chem. Technol. (Nat. Sci. Edit.), 2002, 29(5), 34. (in Chinese)
[7 ] C. Fernndez, A.J. Reviejo and J.M. Pingarrn: Anal. Chim. Acta, 1995, 305, 192.
[8 ] J.P. Gueneau de Mussy, J.V. Macpherson and J.L. Delplancke: Electrochim. Acta, 2003, 48, 1131.
[9 ] J.T. Kong, S.Y. Shi, X.P. Zhu and J.R. Nie: J. Environm. Sci., 2007, 19(11), 1380.
[10] S. Trasatti: Electrochim. Acta, 2000, 45, 2377.
[11] A. Malinauskas, R. Garjonyte, R. Mazeikiene and I. Jureviciute: Talanta, 2004, 64, 121.
[12] M. Panizza, L. Ouattara, E. Baranova and Ch. Comninellis: Electrochem. Commun., 2003, 5, 365.
[13] E. Brillas, I. Sirs, C. Arias, P.L. Cabot, F. Centellas, R.M. Rodrguez and J.A. Garrido: Chemosphere, 2005, 58, 399.
[14] X.M. Chen, F.R. Gao and G.H. Chen: J. Appl. Electrochem., 2005, 35, 185.
[15] G. Cifuentes and C. Luis: Res. Adv. Technol., 1998, 89, 363.
[16] Y.H. Song, G. Wei and R.C. Xiong: Electrochim. Acta, 2007, 52, 7022.
[17] G. Fti, C. Mousty, C. Comninellis and V. Reid: Electrochim. Acta, 1998, 44, 813.
[18] L. Vazquez-Gomez, S. Ferro and A.D. Battisti: Appl. Catal. B-Environ., 2006, 67, 34.
[19] M.E. Makgae, C.C. Theron, W.J. Przybylowicz and A.M. Crouch: Mater. Chem. Phys., 2005, 92, 559.
[20] J. Wang and Y.J. Feng: Techniq. Equipm. Environm. Pollu. Contr., 2005, 7, 19.
[21] Y.Y. Lin, T.A. Tang and J. Yao: Functional Materials, 2001, (3), 227. (in Chinese)
[22] L. Lipp and D. Pletcher: Electrochim. Acta, 1997, 7, 1091.
[23] J.G. Zhang, G. Wei and R.C. Xiong: J. Beijing Univ. Chem. Technol. (Nat. Sci. Edit.), 2007, 34(4), 389. (in Chinese)
[24] X.M. Chen and G.H. Chen: Electrochim. Acta, 2005, 50, 4155.
[25] O. Simond, V. Schaller and C. Comninellis: Electrochim. Acta, 1997, 42, 2009.
[26] Y.J. Li, F. Wang, G.D. Zhou and Y.M. Ni: Chemosphere, 2003, 53, 1229.
[27] R. Tomat and A. Rigo: J. Appl. Electrochem., 1984, 14, 1.
[28] F. Kirzhner, Y. Zimmels, Y. Shraiber: Sep. Purif. Technol., 2008, 63, 38.
[29] K. Bensadok, S. Benammar, F. Lapicque and G. Nezzal: J. Hazard. Mater., 2008, 152, 423. |