J. Mater. Sci. Technol. ›› 2025, Vol. 231: 20-29.DOI: 10.1016/j.jmst.2024.12.078
• Research article • Previous Articles Next Articles
Peng Yanga,1, Peiwen Tonga,1, Hui Xua, Sen Liua,*, Changlin Chena, Yefan Zhanga, Shihao Yua, Wei Wanga, Rongrong Caoa, Haijun Liua, Lei Liaob,*, Qingjiang Lia,*
Received:2024-09-29
Revised:2024-11-15
Accepted:2024-12-14
Published:2025-10-01
Online:2025-03-02
Contact:
*E-mail addresses: About author:1 These authors contributed equally to this work.
Peng Yang, Peiwen Tong, Hui Xu, Sen Liu, Changlin Chen, Yefan Zhang, Shihao Yu, Wei Wang, Rongrong Cao, Haijun Liu, Lei Liao, Qingjiang Li. Highly-reliable ferroelectric thin-film transistors array for hardware implementation of image classification[J]. J. Mater. Sci. Technol., 2025, 231: 20-29.
| [1] E.A.M. van Dis, J. Bollen, R.V. Rooij, W. Zuidema, C.L. Bockting, Nature 614 (2023) 224-226. [2] , AI hardware has an energy problem, Nat.Electron. 6(2023) 463. [3] A.A. Conklin, S.Kumar, Nat. Electron. 6(2023) 464-466. [4] W.Q. Zhang, B. Gao, J.S. Tang, P. Yao, S.M. Yu, M.-F. Chang, H.-J. Yoo, H. Qian, H.Q. Wu, Nat. Electron. 3(2020) 371-382. [5] Q.R. Huang, Z. Yang, K. Ni, M. Imani, C. Zhuo, X.Z. Yin, IEEE Trans. Comput.Aided Design Integr. Circuits Syst. 42(2023) 3829-3839. [6] D. Ielmini, H.-S.P. Wong, Nat.Electron. 1(2018) 333-343. [7] P. Yao, H.Q. Wu, B. Gao, J.S. Tang, Q.T. Zhang, W.Q. Zhang, J.J. Yang, H. Qian, Nature 577 (2020) 641-646. [8] A. Sebastian, M.L. Gallo, R. Khaddam-Aljameh, E. Eleftheriou, Nat. Nanotechnol. 15(2020) 529-544. [9] Y.V.D.Burgt, A. Melianas, S.T. Keene, G. Malliaras, A. Salleo, Nat. Electron. 1(2018) 386-397. [10] G.J. Wu, X.M. Zhang, G.D. Feng, J.L. Wang, K.J. Zhou, J.H. Zeng, D.N. Dong, F.D. Zhu, C.K. Yang, X.M. Zhao, D.N. Gong, M.R. Zhang, B.B. Tian, C.G. Duan, Q. Liu, J.L. Wang, J.H. Chu, M. Liu, Nat. Mater. 22(2023) 1499-1506. [11] Z.W. Liu, J.S. Tang, B. Gao, P. Yao, X.Y. Li, D.K. Liu, Y. Zhou, H. Qian, B. Hong, H.Q. Wu, Nat. Commun. 11(2020) 4234. [12] W.B. Zhang, P. Yao, B. Gao, Q. Liu, D. Wu, Q.T. Zhang, Y.K. Li, Q. Qin, J.M. Li, Z.H. Zhu, Y. Cai, D.B. Wu, J.S. Tang, H. Qian, Y. Wang, H.Q. Wu, Science 381 (2023) 1205-1211. [13] A. Thean, S.-H. Tsai, C.-K. Chen, M. Sivan, B. Tang, S. Hooda, Z.H. Fang, J.M. Pan, J.F. Leong, H. Veluri, E. Zamburg, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 12.2.1-12.2.4. [14] M.-C. Chen, S. Ohshita, S. Amano, Y. Kurokawa, S. Watanabe, Y. Imoto, Y. Ando, W.-H. Hsieh, C.H. Chang, C.C. Wu, S.S. Chuang, H. Yoshida, M.C. Lu, M.H. Liao, S.Z. Chang, S. Yamazaki, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 18.2.1-18.2.4. [15] C.-K. Chen, Z.H. Fang, S. Hooda, M. Lal, U. Chand, Z.F. Xu, J.M. Pan, S.-H. Tsai, E. Zamburg, A.V.-Y. Thean, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 6.1.1-6.1.4. [16] R. An, Y.J. Li, J.S. Tang, B. Gao, Y.W. Du, J. Yao, Y.K. Li, W. Sun, H. Zhao, J.M. Li, Q. Qin, Q.T. Zhang, S. Qiu, Q.W. Li, Z.C. Li, H. Qian, H.Q.Wu, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 18.1.1-18.1.4. [17] X.C. Peng, W. Chakraborty, A. Kaul, W. Shim, M.S. Bakir, S. Datta, S.M.Yu, in: 2020 IEEE International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA , USA , 2020, pp. 30.4.1-30.4.4. [18] S. Choi, J.H. Shin, J. Lee, P. Sheridan, W.D. Lu, Nano Lett. 17(2017) 3113-3118. [19] Z.W. Liu, J.S. Jian, B. Gao, X.Y. Li, P. Yao, Y.D. Lin, D.K. Liu, B. Hong, H. Qian, H.Q. Wu, Sci. Adv. 6 (2020) eabc4797. [20] Y. Park, M.-K. Kim, J.-S. Lee, J. Mater. Chem. C 8 (2020) 9163-9183. [21] V. Joshi, M.L. Gallo, S. Haefeli, I. Boybat, S.R. Nandakumar, C. Piveteau, M. Dazzi, B. Rajendran, A. Sebastian, E. Eleftheriou, Nat. Commun. 11(2020) 2473. [22] Q. Wang, G. Niu, W. Ren, R.B. Wang, X.G. Chen, X. Li, Z.-G. Ye, Y.-H. Xie, S.N. Song, Z.T. Song, Adv. Electron. Mater. 7(2021) 2001241. [23] S. Li, A. Du, Y.D. Wang, X.R. Wang, X.Y. Zhang, H.Y. Cheng, W.L. Cai, S.Y. Lu, K.H. Cao, B. Pan, N. Lei, W. Kang, J.M. Liu, A. Fert, Z.P. Hou, W.S. Zhao, Sci. Bull. 67(2022) 691-699. [24] J. Grollier, D. Querlioz, K.Y. Camsari, K. Everschor-Sitte, S. Fukami, M.D. Stiles, Nat. Electron. 3(2020) 360-370. [25] T.S. Böscke, J. Müller, D. Bräuha us, U.Sc hröder, U. Böttger, Appl. Phys. Lett. 99(2011) 102903. [26] F.S. James, A.P.D.A. Carlos, Science 246 (1989) 1400-1405. [27] J. Müller, P. Polakowski, S. Mueller, T. Mikolajick, ECS J. Solid State Sci. Technol. 4(2015) N30-N35. [28] S.Y. Wu, X.M. Zhang, R.R. Cao, K.J. Zhou, J.K. Li, C. Li, Y. Yang, D.S. Shang, Y.F. Wei, H. Jiang, Q. Liu, Appl. Phys. Lett. 124(2024) 102902. [29] L. Bao, Z.W. Wang, Y.H. Shi, Y.T. Ling, Y.F. Yang, L.B. Shan, S.Y.B.Sin, C.M. Wang, Q.L. Zheng, J. Kim, H. Hosono, Y.M. Cai, R. Huang, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 2.3.1-2.3.4. [30] C. Zhang, D. Li, P.T. Lai, X.D. Huang, IEEE Electron Dev. Lett. 43(2021) 32-35. [31] K.-H. Kim, S.Oh, M.M.A. Fiagbenu, J. Zheng, P. Musavigharavi, P. Kumar, N. Trainor, A. Aljarb, Y. Wan, H.M. Kim, K. Katti, S. Song, G. Kim, Z. Tang, J.-H. Fu, M. Hakami, V. Tung, J.M. Redwing, E.A. Stach, R.H. Olsson, D. Jariwala, Nat. Nanotechnol. 18(2023) 1044. [32] K.Q. Liu, T. Zhang, B.J. Dang, L. Bao, L.Y. Xu, C.D. Cheng, Z. Yang, R. Huang, Y.C. Yang, Nat. Electron. 5(2022) 761-773. [33] Y. Zhou, Y. Wang, F. Zhuge, J.M. Guo, S. Ma, J.L. Wang, Z.J. Tang, Y. Li, X.S. Miao, Y.H. He, Y. Chai, Adv. Mater. 34(2022) 2107754. [34] S.S. Cheema, N. Shanker, L.-C. Wang, C.-H. Hsu, S.-L. Hsu, Y.-H. Liao, M.S. Jose, J. Gomez, W. Chakraborty, W.S. Li, J.-H. Bae, S.K. Volkman, D. Kwon, Y. Rho, G. Pinelli, R. Rastogi, D. Pipitone, C. Stull, M. Cook, B. Tyrrell, V.A. Stoica, Z. Zhang, J.W. Freeland, C.J. Tassone, A. Mehta, G. Saheli, D. Thompson, D.I. Suh, W.-T. Koo, K.-J. Nam, D.J. Jung, W.-B. Song, C.-H. Lin, S. Nam, J. Heo, N. Parihar, C.P. Grigoropoulos, P. Shafer, P. Fay, R. Ramesh, S. Mahapatra, J. Ciston, S. Datta, M. Mohamed, C. Hu, S. Salahuddin, Nature 604 (2022) 65-71. [35] H. Liu, J. Li, G.S. Wang, J.J. Chen, X. Yu, Y. Liu, C.J. Jin, S.L. Wang, Y. Hao, G.Q. Han, IEEE Trans. Electron Dev. 69(2022) 1028-1033. [36] J. Luo, H.Y. Shao, B.Y. Fu, Z.Y. Fu, W.K. Xu, K.F. Wang, M.X. Yang, Y.Q. Li, X. Lv, Q.Q. Huang, R. Huang, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 36.3.1-36.3.4. [37] J.D. Zhu, T. Zhang, Y.C. Yang, R. Huang, Appl. Phys. Rev. 7(2020) 011312. [38] N. Mohta, A. Rao, N. Remesh, R. Muralidharan, D.N. Nath, RSC Adv. 11(2021) 36901. [39] M.-K. Kim, J.-S. Lee, Nano Lett. 19(2019) 2044-2050. [40] C.L. Wang, Y.Z. Li, Y.C. Wang, X.D. Xu, M.Y. Fu, Y.Y. Liu, Z.Q. Lin, H.F. Ling, P. Gkoupidenis, M.D. Yi, L.H. Xie, F. Yan, W. Huang, J. Mater. Chem. C 9 (2021) 11464. [41] M.-K. Kim, I.-J. Kim, J.-S. Lee, Sci. Adv. 8 (2022) eabm8537. [42] I.-J. Kim, M.-K. Kim, J.-S. Lee, Nat. Commun. 14(2023) 504. [43] W.C.Y.Ma, C.J. Su, K.H. Kao, T.C. Cho, Q. Guo, C.J. Wu, P.Y. Wu, J.Y. Hung, ECS J. Solid State Sci. Technol. 12(2023) 055006. [44] H. Joh, S. Nam, M. Jung, H. Shin, S.H. Cho, S. Jeon, ACS Appl. Mater. Interfaces 15 (2023) 51339. [45] J. Hwang, H. Joh, C. Kim, J. Ahn, S. Jeon, ACS Appl. Mater. Interfaces 16 (2024) 2467-2476. [46] K.A. Aabrar, J. Gomez, S.G. Kirtania, M.S. Jose, Y.D. Luo, P.G. Ravikumar, P.V. Ravindran, H.C. Ye, S. Banerjee, S. Dutta, A.I. Khan, S.M. Yu, S. Datta, in: 2021 IEEE International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA , USA , 2021, pp. 19.6.1-19.6.4. [47] S. Dutta, H.C. Ye, A.A. Khandker, S.G. Kirtania, A. Khanna, K. Ni, S. Datta, IEEE Electron Device Lett. 43(2022) 382-385. [48] Y. Zhu, Y.L. He, S.S. Jiang, L. Zhu, C.S. Chen, Q. Wan, J. Semicond. 42(2021) 031101. [49] D. Geng, K. Wang, L. Li, K. Myny, A. Nathan, J. Jang, Y. Kuo, M. Liu, Nat. Electron. 6(2023) 963-972. [50] J.H. Bi, X.M. Zou, Y.W. Lv, G.L. Li, X.Q. Liu, Y. Liu, T. Yu, Z.Y. Yang, L. Liao, Adv. Electron. Mater. 6 (2020) 2000291. [51] T. Miyasako, M. Senoo, E. Tokumitsu, Appl. Phys. Lett. 86(2005) 162902. [52] D. Lehninger, M. Ellinger, T. Ali, S. Li, K. Mertens, M. Lederer, R. Olivio, T. Kämpfe, N. Hanisch, K. Biedermann, M. Rudolph, V. Brackmann, S. Sanctis, M.P.M. Jank, K. Seidel, Adv. Electron. Mater. 7 (2021) 2100082. [53] I.-J. Kim, M.-K. Kim, J.-S. Lee, IEEE Electron Dev. Lett 44 (2023) 249-252. [54] Z. Lin, M. Si, Y.-C. Luo, X. Lyu, A. Charnas, Z. Chen, Z. Yu, W. Tsai, P.C. McIntyre, R. Kanjolia, M. Moinpour, S. Yu, P.D. Ye, in: 2021 IEEE International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA , USA , 2021, pp. 17.4.1- 17.4.4. [55] J.-H. Yang, C.-W. Byun, J.-E. Pi, H.-O. Kim, C.-S. Hwang, S. Yoo, IEEE Trans. Electron Dev. 69(2022) 120-126. [56] B.B. Tian, Z.Z. Xie, L.Q. Chen, S.L. Hao, Y.F. Liu, G.D. Feng, X.F. Liu, H.B. Liu, J. Yang, Y.Y. Zhang, W. Bai, T. Lin, H. Shen, X.J. Meng, N. Zhong, H. Peng, F.Y. Yue, X.D. Tang, J.L. Wang, Q.X. Zhu, Y. Ivry, B. Dkhil, J. Chu, C.G. Duan, Exploration 3 (2023) 20220126. [57] K. Lee, S. Kim, M. Kim, J.-H. Lee, D.Kwon, B.-G. Park, IEEE Trans. Electron. Dev. 69(2022) 1048-1053. [58] C. Jin, C.J. Su, Y.J. Lee, P.J. Sung, T. Hiramoto, M. Kobayashi, IEEE Trans. Electron. Dev. 68(2021) 1304-1312. [59] K. Ni, P. Sharma, J.C. Zhang, M. Jerry, J.A. Smith, K. Tapily, R. Clark, S. Mahapatra, S. Datta, IEEE Trans. Electron Dev. 65(2018) 2461-2469. [60] K. Ni, J.A. Smith, B. Grisafe, T. Rakshit, B. Obradovic, J.A. Kittl, M. Rodder, S. Datta, SoC logic compatible multi-Bit FeMFET weight cell for Neuromorphic application, in: 2018 IEEE International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2018, pp. 13.2.1-13.2.4. [61] X.L. Wang, Z.J. Zheng, Q.W. Kong, L. Jiao, K. Han, C. Sun, Z. Zhou, L. Liu, Y. Kang, G. Liu, D. Zhang, X. Gong, in: 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits), IEEE, Kyoto, Japan, 2023, pp. 1-2. [62] C. Sun, X. Wang, H. Xu, J. Zhang, Z. Zheng, Q. Kong, Y. Kang, K. Han, L. Jiao, Z. Zhou, Y. Chen, D. Zhang, G. Liu, L. Liu, X. Gong, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA, USA, 2022, pp. 2.1.1-2.1.4. [63] Z. Zheng, L. Jiao, Z. Zhou, Y. Wang, L. Liu, K. Han, C. Sun, Q. Kong, D. Zhang, X. Wang, K. Ni, X. Gong, in: 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits), IEEE, Kyoto, Japan, 2023, pp. 1-2. [64] J. Jang, S. Gi, I. Yeo, S. Choi, S. Jang, S. Ham, B. Lee, G. Wang, Adv. Sci. 9(2022) 2201117. [65] W. Shin, J. Im, R.-H. Koo, J.Kim, K.-R. Kwon, D. Kwon, J.-J. Kim, J.-H. Lee, D. Kwon, Adv. Sci. 10(2023) 2207661. [66] Q. Kong, L. Liu, Z.J. Zheng, C. Sun, A. Kumar, R. Shao, Z.P. Zhou, L.M. Jiao, J.S. Zhang, H.W. Xu, Y. Chen, G. Liu, D. Zhang, X.L. Wang, B.-Y. Nguyen, X. Gong, in: 2022 International Electron Devices Meeting (IEDM), IEEE, San Francisco, CA , USA , 2022, pp. 12.3.1-12.3.4. [67] K.H. Lee, N. Verma, IEEE J. Solid-State Circuits 48 (2013) 1625-1637. |
| [1] | Woochan Chung, Doohyung Kim, Juri Kim, Jongmin Park, Sungjun Kim, Sejoon Lee. Optically and electrically modulated artificial synapses based on MoS2/PZT ferroelectric field-effect transistor for neuromorphic computing system [J]. J. Mater. Sci. Technol., 2025, 218(0): 25-34. |
| [2] | Jianhong Duan, Kun Wei, He Qi, Huifen Yu, Hao Li. High-entropy lead-free relaxors for large capacitive energy storage with superior comprehensive performance [J]. J. Mater. Sci. Technol., 2025, 228(0): 34-41. |
| [3] | Yizheng Bao, Xuefeng Chen, Kunjie Lou, Canyu Che, Fei Cao, Shiguang Yan, Genshui Wang. Insights into the intelligent multi-field response of nonlinear permittivity in the canonical antiferroelectric ceramics [J]. J. Mater. Sci. Technol., 2025, 204(0): 10-17. |
| [4] | Ming Yin, Ying Zhang, Hai-Rui Bai, Peng Li, Yu-Chao Li, Wei-Fang Han, Ji-Gong Hao, Wei Li, Chun-Ming Wang, Peng Fu. Preeminent energy storage properties and superior stability of (Ba(1-x)Bix)(Ti(1-x)Mg2x/3Tax/3)O3 relaxor ferroelectric ceramics via elongated rod-shaped grains and domain structural regulation [J]. J. Mater. Sci. Technol., 2024, 184(0): 207-220. |
| [5] | Ming Li, Zhengmiao Zou, Zihao Xu, Junfeng Zheng, Yushan Li, Ruiqiang Tao, Zhen Fan, Guofu Zhou, Xubing Lu, Junming Liu. Ferroelectric polarization and conductance filament coupling for large window and high-reliability resistive memory and energy-efficient synaptic devices [J]. J. Mater. Sci. Technol., 2024, 198(0): 36-43. |
| [6] | Zhi Yun Yue, Zhi Dong Zhang, Zhan Jie Wang. Enhanced memristor performance via coupling effect of oxygen vacancy and ferroelectric polarization [J]. J. Mater. Sci. Technol., 2024, 171(0): 139-146. |
| [7] | Jian Guo, Ji Zhang, Jing Wang, Shan-Tao Zhang. Distinct microstructure and property evolution of 0.76(Bi0.5Na0.5)TiO3-0.24SrTiO3 ferroelectric ceramics synthesized with different TiO2 reactants [J]. J. Mater. Sci. Technol., 2023, 151(0): 73-79. |
| [8] | Xiang Li, Jing Wang, Xingyuan San, Ning Wang, Lei Zhao. High energy storage performance in AgNbO3 relaxor ferroelectric films induced by nanopillar structure [J]. J. Mater. Sci. Technol., 2023, 155(0): 160-166. |
| [9] | Jinhui Fan, Xiaoyan Lu, Wenwu Cao. Quantification of polarization distribution from polarizing light microscopy images of ferroelectric single crystals [J]. J. Mater. Sci. Technol., 2023, 161(0): 1-9. |
| [10] | Hong Li, Bo Wu, Cong Lin, Xiao Wu, Tengfei Lin, Min Gao, Hong Tao, Wenjuan Wu, Chunlin Zhao. Microscopic origin and relevant grain size effect of discontinuous grain growth in BaTiO3-based ferroelectric ceramics [J]. J. Mater. Sci. Technol., 2023, 164(0): 119-128. |
| [11] | Man Zhang, Vladimir Koval, Yu Shi, Yajun Yue, Chenglong Jia, Jiagang Wu, Giuseppe Viola, Haixue Yan. Magnetoelectric coupling at microwave frequencies observed in bismuth ferrite-based multiferroics at room temperature [J]. J. Mater. Sci. Technol., 2023, 137(0): 100-103. |
| [12] | Yating Ning, Yongping Pu, Chunhui Wu, Shiyu Zhou, Lei Zhang, Jinbo Zhang, Xian Zhang, Yangchao Shang. Enhanced capacitive energy storage and dielectric temperature stability of A-site disordered high-entropy perovskite oxides [J]. J. Mater. Sci. Technol., 2023, 145(0): 66-73. |
| [13] | Dao Wang, Yan Zhang, Jiali Wang, Chunlai Luo, Ming Li, Wentao Shuai, Ruiqiang Tao, Zhen Fan, Deyang Chen, Min Zeng, Jiyan Y. Dai, Xubing B. Lu, J.-M. Liu. Enhanced ferroelectric polarization with less wake-up effect and improved endurance of Hf0.5Zr0.5O2 thin films by implementing W electrode [J]. J. Mater. Sci. Technol., 2022, 104(0): 1-7. |
| [14] | Xudong Qi, Kai Li, Enwei Sun, Bingqian Song, Da Huo, Jiaming Li, Xianjie Wang, Rui Zhang, Bin Yang, Wenwu Cao. Large photovoltaic effect with ultrahigh open-circuit voltage in relaxor-based ferroelectric Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 ceramics [J]. J. Mater. Sci. Technol., 2022, 104(0): 119-126. |
| [15] | Dingshuai Feng, Biaohong Huang, Lingli Li, Xiaoqi Li, Youdi Gu, Weijin Hu, Zhidong Zhang. The effects of Eu3+ doping on the epitaxial growth and photovoltaic properties of BiFeO3 thin films [J]. J. Mater. Sci. Technol., 2022, 106(0): 49-55. |
| Viewed | ||||||
|
Full text |
|
|||||
|
Abstract |
|
|||||
WeChat
