[1 ] M. Bickermann, D. Hofmann, T.L. Straubinger, R.
Weing?artner, P.J. Wellmann and A. Winnacker: Appl.
Surf. Sci., 2001, 184, 84.
[2 ] J.R. Jenny, M. Skowronski, W.C. Mitchel, H.M. Hob-
good, R.C. Glass, G. Augustine and R.H. Hopkins: J.
Appl. Phys., 1995, 78(6), 3839.
[3 ] G. Augustine, V. Balakrishna and C.D. Brandt: J.
Cryst. Growth, 2000, 211, 339.
[4 ] E. Sanchez, J. Wan, S. Wang, M. Loboda, C. Li and
M. Skowronski: Mater. Sci. Forum, 2004, 457-460,
669.
[5 ] H. McD Hobgood, R.C. Glass, G. Augustine and R.H.
Hopkins: Appl. Phys. Lett., 1995, 66(11), 1364.
[6 ] P. Grosse, G. Basset, C. Calvat, M. Couchaud, C.
Faure, B. Ferrand, Y. Grange, M. Anikin, J.M. Bluet,
K. Chourou and R. Madar: Mater. Sci. Eng. B, 1999,
61-62, 58.
[7 ] K. Semmelroth, N. Schulze and G. Pensl: J. Phys:
Condensed Matter, 2004, 16, 1597.
[8 ] G. Augustine, H. McD Hobgood, V. Balakrishna, G.T.
Dunne, R.H. Hopkins, R.N. Thomas, W.A. Doolittle
and A. Rohatgi: Mater. Sci. Forum, 1998, 264-268,
9.
[9 ] Reshanov Sergey A: Diam. Relat. Mater., 2000, 9,
480.
[10] M. Bickermann, B.M. Epelbaum, D. Hofmann, T.L.
Straubinger, R.Weing?artner and Winnacker: J. Cryst.
Growth, 2001, 233, 211.
[11] W. Hartung, M. Rasp, D. Hofmann and A. Winnacker:
Mater. Sci. Eng. B, 1999, 61-62, 102.
[12] C. Wang, Y.M. Zhang, Y.M. Zhang, G.L. Ma, H. Guo
and D.Q. Xu: Chin. Phys., 2007, 16, 2455.
[13] S.Z. Jiang, X.G. Xu, J. Li, X.F. Chen, Y.M. Wang,
L.N. Ning, X.B. Hu, J.Y.Wang and M.H. Jiang: Chin.
J. Semiconductors, 2007, 28(5), 810.
[14] X.B. Hu, X.G. Xu, X.X. Li, S.Z. Jiang, J. Li, L. Wang,
J.Y. Wang and M.H. Jiang: J. Cryst. Growth, 2006,
292, 192.
[15] M. Bickermann, R. Weing?artner and A. Winnacker: J.
Cryst. Growth, 2003, 254, 390.
[16] M.S. Mazzola, S.E. Sanddow and A. Sch?aner: Mater.
Sci. Forum, 1998, 264-268, 119.
[17] P.G. Muzykov, Y.I. Khlebnikov, S.V. Regula, Y. Gao
and T.S. Sudarshan: J. Electro. Mater., 2003, 32(6),
505. |