Growth of Niobium Thin Films on Si Substrates by Pulsed Nd:YAG Laser Deposition

doi:10.1016/j.jmst.2015.06.007

J. Mater. Sci. Technol. ›› 2015, Vol. 31 ›› Issue (8): 784-789.DOI: 10.1016/j.jmst.2015.06.007

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Growth of Niobium Thin Films on Si Substrates by Pulsed Nd:YAG Laser Deposition

Francisco Gontad¹, Antonella Lorusso^{1, *}, Luigi Solombrino¹, Ioannis Koutselas², Nikos Vainos², Alessio Perrone¹

1 Department of Mathematics and Physics “E. De Giorgi”, and National Institute of Nuclear Physics, University of Salento, 73100 Lecce, Italy; 2 Department of Materials Science, University of Patras, 26500 Patras, Greece

Received:2014-12-19 Online:2015-08-20
Contact: * Corresponding author. Ph.D.; Tel.: t39 832 297501.E-mail address: antonella.lorusso@le.infn.it (A. Lorusso).
Supported by:
We gratefully acknowledge Professor M. Di Giulio for profilometric measurements and Mr. L. Monteduro for his expert technical support. This work was supported partially by the Italian Ministry of Research in the framework of FIRB-Fondo per gli Investimenti della Ricerca di Base (Project no. RBFR12NK5K) and the Italian National Institute of Nuclear Physics (INFN).

Abstract

Abstract: The growth of Nb thin films on Si(100) substrates by pulsed Nd:YAG laser deposition (PLD) under different laser fluences (4-15 J/cm²) was reported. The influence of laser fluence on ablation rate and deposition rate was discussed. X-ray diffraction (XRD) investigations of the deposited films showed an amorphous structure. The droplet density on the film surface observed by scanning electron microscopy (SEM) analyses was extremely low. It was experimentally proved that the droplets on the film surface originated from liquid phase on the target surface. Profilometric measurements of the deposited Nb films revealed a substantial asymmetry in the film thickness related to the plume deflection effect. The measured electrical resistivity of the Nb film was higher than that of high purity Nb bulk. The present investigations of ablation and deposition process of Nb thin films are related to its potential application in superconducting radio-frequency (SRF) cavities.

Key words: Pulsed laser deposition, Nb thin films, Ablation and deposition rate

Francisco Gontad, Antonella Lorusso, Luigi Solombrino, Ioannis Koutselas, Nikos Vainos, Alessio Perrone. Growth of Niobium Thin Films on Si Substrates by Pulsed Nd:YAG Laser Deposition[J]. J. Mater. Sci. Technol., 2015, 31(8): 784-789.

Figures/Tables 9

Scheme of the typical experimental setup used for the PLD technique. M: Mirror

A: Attenuator

L: Lens

W: Laser Window

S: Substrate

T: Target

TR: Target Rotation feedthrough

SH: Shutter

F: x?y?z substrate motion system

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Growth of Niobium Thin Films on Si Substrates by Pulsed Nd:YAG Laser Deposition

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