J. Mater. Sci. Technol. ›› 2016, Vol. 32 ›› Issue (11): 1192-1196.DOI: 10.1016/j.jmst.2016.10.005
• Orginal Article • Previous Articles Next Articles
Gontad F.1,Lorusso A.1(),Manousaki A.2,Klini A.2,Perrone A.1
Received:
2016-03-09
Accepted:
2016-06-06
Online:
2016-11-20
Published:
2017-02-16
Gontad F.,Lorusso A.,Manousaki A.,Klini A.,Perrone A.. Morphology and Structure of Nb Thin Films Grown by Pulsed Laser Deposition at Different Substrate Temperatures[J]. J. Mater. Sci. Technol., 2016, 32(11): 1192-1196.
Laser parameters | Wavelength (nm) | 355 | ||||
---|---|---|---|---|---|---|
Pulse duration (ns) | 7 | |||||
Repetition rate (Hz) | 10 | |||||
Cleaning pulses | 2,000 | |||||
Deposition pulses | 20,000 (~800 pulses/site) | |||||
Energy density (J/cm2) | 10 | |||||
Spot size (mm) | 1.2 | |||||
Target-substrate distance (cm) | 4 | |||||
Base pressure (Pa) | 5 × 10-6 | |||||
Target rotation angular speed (Hz) | 3 | |||||
Angle of incidence (deg.) | 45 | |||||
Ts (K) | 300 | 380 | 460 | 570 | 660 | |
Average ablation rate (µg/pulse) | 0.38 |
Table 1. Experimental parameters employed for PLD growth of Nb films
Laser parameters | Wavelength (nm) | 355 | ||||
---|---|---|---|---|---|---|
Pulse duration (ns) | 7 | |||||
Repetition rate (Hz) | 10 | |||||
Cleaning pulses | 2,000 | |||||
Deposition pulses | 20,000 (~800 pulses/site) | |||||
Energy density (J/cm2) | 10 | |||||
Spot size (mm) | 1.2 | |||||
Target-substrate distance (cm) | 4 | |||||
Base pressure (Pa) | 5 × 10-6 | |||||
Target rotation angular speed (Hz) | 3 | |||||
Angle of incidence (deg.) | 45 | |||||
Ts (K) | 300 | 380 | 460 | 570 | 660 | |
Average ablation rate (µg/pulse) | 0.38 |
Ts (K) | 300 | 380 | 460 | 570 | 660 |
---|---|---|---|---|---|
RMS roughness (nm) | 9 ± 1 | 10 ± 1 | 7 ± 1 | 5 ± 1 | 15 ± 1 |
Table 2. Film RMS roughness at different substrate temperatures
Ts (K) | 300 | 380 | 460 | 570 | 660 |
---|---|---|---|---|---|
RMS roughness (nm) | 9 ± 1 | 10 ± 1 | 7 ± 1 | 5 ± 1 | 15 ± 1 |
Fig. 3. SEM cross-section images of the films deposited at: (a) 300 K (where the columnar growth is observed), (b) 660 K, with two clear different growth regions parallel to the substrate.
Fig. 4. XRD patterns of PLD deposited Nb films: (a) main contributions from the film, (b) (110) peak at different Ts and (c) (220) peak at different Ts.
Ts (K) --------------------- | 300 | 380 | 460 | 570 | 660 | |
---|---|---|---|---|---|---|
Position | (110) | 38.46 | 38.45 | 38.50 | 38.46 | 38.58 |
(220) | 82.36 | 82.46 | 82.58 | 82.40 | 82.72 | |
FWHM | (110) | 0.35 | 0.35 | 0.54 | 0.61 | 0.31 |
(220) | 0.78 | 0.77 | 1.15 | 1.18 | 0.68 | |
Crystal size (nm) | (110) | 0.049 | 0.50 | 0.33 | 0.29 | 0.57 |
(220) | 1.33 | 1.37 | 0.93 | 0.89 | 1.61 |
Table 3. FWHM, peak position and crystal size (calculated by Scherrer equation structure[29]) at different substrate temperatures
Ts (K) --------------------- | 300 | 380 | 460 | 570 | 660 | |
---|---|---|---|---|---|---|
Position | (110) | 38.46 | 38.45 | 38.50 | 38.46 | 38.58 |
(220) | 82.36 | 82.46 | 82.58 | 82.40 | 82.72 | |
FWHM | (110) | 0.35 | 0.35 | 0.54 | 0.61 | 0.31 |
(220) | 0.78 | 0.77 | 1.15 | 1.18 | 0.68 | |
Crystal size (nm) | (110) | 0.049 | 0.50 | 0.33 | 0.29 | 0.57 |
(220) | 1.33 | 1.37 | 0.93 | 0.89 | 1.61 |
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