[1 ] C.W. Tang and S.A. VanSlyke: Appl. Phys. Lett.,
1987, 51, 913.
[2 ] Y. Jiang, J. Wang, J. Yu, W. Li, X. Wei and Z. Wu:
Jpn. J. Appl. Phys., 2007, 46, 523.
[3 ] J. Yu, W. Li, Y. Jiang and L. Li: Jpn. J Appl. Phys.,
2007, 46, 31.
[4 ] J. Wang, J. Yu, H. Lin, Y. Jiang, S. Lou and G. Yang:
Semicond. Sci. Technol., 2007, 22, 25.
[5 ] B. Lucas, W.Rammal and A. Moliton: EPJ Appl.
Phys., 2006, 34, 179.
[6 ] D.R. Gibson, I. Brinkley and J.M. Walls: SPIE, 2004,
5618, 156..
[7 ] A. Salehi: Thin Solid Films, 1998, 324, 214.
[8 ] V. Craciun, D. Craciun, Z. Chen, J. Hwang and R.K.
Singh: Appl. Surf. Sci., 2000, 168, 118.
[9 ] F.O. Adurodija, H. Izumi, T. Ishihara, H. Yoshioka, H.
Matsui and M. Motoyama: Vacuum, 2000, 59, 641.
[10] J.H. Shin, S.H. Shin, J.I. Park and H.H. Kim: J. Appl.
Phys., 2001, 89, 5199.
[11] Y. Shigesato and D.C. Paine: Thin Solid Films, 1994,
238, 44.
[12] T. Minami, H. Sonohara, T. Kakumu and S. Takata:
Thin Solid Films, 1995, 270, 37.
[13] V. Singh, B. Saswat and S. Kumar: Mater. Res. Soc.,
2005, 869, 139.
[14] S. Uthanna, P.S. Reddy, B.S. Naidu and P. Jayarama
Reddy: Vacuum, 1996, 47, 91.
[15] K. Kim, Y. Tak, H. Park, K. Lee and J. Lee: Mat.
Research Society, 2002, 78, 809.
[16] Y.S. Jung, D.W. Lee and D.Y. Jeon: Appl. Surf. Sci.,
2004, 221, 136.
[17] S.H. Shin, J.H. Shin, K.J. Park, T. Ishida, O. Tabata
and H.H. Kim: Thin Solid Films, 1999, 341, 225. |