J Mater Sci Technol ›› 2011, Vol. 27 ›› Issue (8): 729-734.

• Modeling and Simulations • Previous Articles     Next Articles

Computer Simulation of Fe-Al-Si System Diffusion Couples

Zhongping He1), Yanlin He1), Yi Gao2), Lin Li1), Shuigen Huang1,3), Omer Van der Biest3)   

  1. 1) School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China
    2) Cold Rolling Plant of Ansteel, Anshan 114021, China
    3) Department of Metallurgy and Materials Engineering, Katholieke Universiteit Leuven, Kasteelpark Arenberg 44, B-3001 Heverlee, Belgium
  • Received:2010-11-04 Revised:2010-12-13 Online:2011-08-30 Published:2011-08-30
  • Contact: Yanlin He
  • Supported by:

    the National Natural Science Foundation of China under Grant Nos. 50971137 and 50934011 and by the National Basic Research program of China under Grant No. 2010CB630802

Abstract: Diffusion couples, Fe-6.8 wt% Al-1.0 wt% Si/Fe and Fe-6.3 wt% Al-0.9 wt% Si/Fe were constructed and separately annealed at 1050°C for 3 h and at 1000°C for 64 h. The concentration profiles of Fe, Al and Si atoms in these couples were measured by electron probe micro-analysis (EPMA), while the diffusion behavior was also simulated by coupling thermodynamic and kinetic properties of Fe-Al-Si system. The simulation results were in good agreement with the measured concentration profiles showing the validity of dynamic parameters of Fe-Al-Si system. Calculation was made for Fe-7 wt% Al-1 wt% Si/Fe diffusion couples at 1000°C with different diffusion time. Silicon uphill was found under the in°uence of aluminum.

Key words: Diffusion kinetics, Fe-Al-Si system, Thermo-calc and DICTRA