Sol-Gel Based Soft Lithography and Piezoresponse Force Microscopy of Patterned Pb(Zr0:52Ti0:48)O3 Microstructures

J Mater Sci Technol ›› 2010, Vol. 26 ›› Issue (5): 439-444.

• Novel Processing and Characterization Methods • Previous Articles Next Articles

Sol-Gel Based Soft Lithography and Piezoresponse Force Microscopy of Patterned Pb(Zr_0:52Ti_0:48)O₃ Microstructures

Lining Lan, Shuhong Xie, Li Tan, Jiangyu Li

1) Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, and Faculty of Materials, Optoelectronics and Physics, Xiangtan University, Xiangtan 411105, China
2) Department of Engineering Mechanics, University of Nebraska, Lincoln, 68588-0526, USA
3) Department of Mechanical Engineering, University of Washington, Seattle, Washington, 98195-2600, USA

Received:2009-09-21 Revised:2010-03-09 Online:2010-05-31 Published:2010-06-01
Contact: Xie shuhong

Abstract

Abstract:

Sol-gel based soft lithography technique has been developed to pattern a variety of ferroelectric Pb(Zr_0:52Ti_0:48)O₃ (PZT) microstructures, with feature size approaching 180 nm and good pattern transfer between the master mold and patterned films. X-ray diffraction and high-resolution transmission electron microscopy confirm the perovskite structure of the patterned PZT. Piezoresponse force microscopy (PFM) and switching spectroscopy piezoresponse force microscopy (SSPFM) confirm their piezoelectricity and ferroelec-
tricity. Piezoresponse as high as 2.75 nm has been observed, comparable to typical PZT films. The patterned PZT microstructures are promising for a wide range of device applications.

Key words: soft lithography, Piezoresponse force microscopy, PZT

Lining Lan Shuhong Xie Li Tan Jiangyu Li. Sol-Gel Based Soft Lithography and Piezoresponse Force Microscopy of Patterned Pb(Zr_0:52Ti_0:48)O₃ Microstructures[J]. J Mater Sci Technol, 2010, 26(5): 439-444.

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Sol-Gel Based Soft Lithography and Piezoresponse Force Microscopy of Patterned Pb(Zr_0:52Ti_0:48)O₃ Microstructures

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