Effect of Sample Configuration on Droplet-Particles of TiN Films

J Mater Sci Technol ›› 2009, Vol. 25 ›› Issue (05): 681-686.

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Effect of Sample Configuration on Droplet-Particles of TiN Films

Yanhui Zhao, Guoqiang Lin, Jinquan Xiao, Chuang Dong, Lishi Wen

1) Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China
2) Key Laboratory of Materials Modi¯cation by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116085, China

Received:2008-10-13 Revised:2009-07-31 Online:2009-09-28 Published:2009-10-10
Contact: Zhao Yanhui
Supported by:
the National Natural Science Foundation of China under grant No. 50801062

Abstract

Abstract:

Orthogonal experiments are used to design the pulsed bias related parameters, including bias magnitude, duty cycle and pulse frequency, during arc ion deposition of TiN films on stainless steel substrates in the case of samples placing normal to the plasma flux. The effect of these parameters on the amount and the size distribution of droplet-particles are investigated, and the results have provided sufficient evidence for the physical model, in which particles reduction is due to the case that the particles are negatively charged and repulsed from negative pulse electric field. The effect of sample configuration on amount and size distribution of the particles are analyzed. The results of the amount and size distribution of the particles are compared to those in the case of samples placing parallel to the plasma flux.

Key words: Arc ion plating, Pulsed bias, TiN film, Droplet-particles

Yanhui Zhao,Guoqiang Lin,Jinquan Xiao,Chuang Dong,Lishi Wen. Effect of Sample Configuration on Droplet-Particles of TiN Films[J]. J Mater Sci Technol, 2009, 25(05): 681-686.

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Effect of Sample Configuration on Droplet-Particles of TiN Films

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