J Mater Sci Technol ›› 2006, Vol. 22 ›› Issue (03): 353-358.

• Research Articles • Previous Articles     Next Articles

Improvement of Optical Reactivity for Nano-TiO2 Film by Nitrogen ECR Plasma

Yuying XIONG, Tao MA, Linghong KONG, Junfang CHEN, Xianqiu WU, Honghua YU, Zhenxi ZHANG   

  1. School of Life Science and Technology, Xi'an Jiaotong University, Xi'an 710049, China; School of Physics and Telecommunications Engineering, South China Normal University, Guangzhou 510631, China
  • Received:2005-01-10 Revised:2005-07-18 Online:2006-05-28 Published:2009-10-10
  • Contact: Yuying XIONG

Abstract: Nitrogen ion was implanted into the nano-TiO2 film surfaces by electron cyclotron resonance (ECR) plasma modification to improve the optical reactivity in visible-light region for nano-TiO2. Diagnosing the N2 plasma by optical emission spectroscopy (OES) was applied to the process of plasma modification. X-ray photoelectron spectroscopy (XPS) was used for analysis of the binding of element after plasma modification. It is shown that the surface modification was caused by excitated N. The injecting of N2 and N2+ leads to the increase in the dissociative interstitial state N in the films. The doped N makes for TiO2-xNx appearing in the TiO2 films. TiO2-xNx forms the impurity energy state in the TiO2 energy band gap and reduces the energy band gap. This is the main reason leading to the red shift of absorption edge.

Key words: ECR plasma surface treatment, Titanium dioxide nitrogen doping, Optical emission spectroscopy...