Abstract: Cr₂O₃ thin films have attracted extensive attention for applications in optical, electronic, and magnetic fields owing to their abundant magnetoelectric properties. Elemental doping plays an important role in regulating the electronic and magnetic properties of Cr₂O₃ thin films. In this study, epitaxial pure and high-concentration Fe-doped Cr₂O₃ thin films (Cr:Fe = 1:1) were grown on Al₂O₃ (0001) substrates by pulsed laser deposition. Structural characterization by X-ray diffraction and transmission electron microscope confirmed that both films retain the corundum-type structure. Fe atoms are homogeneously incorporated into the doped thin film by substituting Cr atoms. The interfacial misfit dislocations in the Fe-doped Cr₂O₃ thin film exhibit regular spacing and a partial dislocation structure with a Burgers vector of b = 1/6$ [\overline{1} 2 \overline{1} 0]$, while the pure Cr₂O₃ thin film shows incomplete dislocation dissociation, resulting in broadened strain regions around the dislocation cores. Magnetic property measurements by magnetic force microscopy and superconducting quantum interference device revealed that the Fe-doped Cr₂O₃ thin film exhibits weak ferromagnetism, distinct from the antiferromagnetic nature of the pure Cr₂O₃ thin film.

Key words: Cr₂O₃ film, Fe doping, Microstructure, Misfit dislocation, Weak ferromagnetism