J. Mater. Sci. Technol. ›› 2025, Vol. 230: 236-243.DOI: 10.1016/j.jmst.2024.12.064

• Research Article • Previous Articles     Next Articles

Linear magnetoresistance, weak antilocalization and electron-hole coexistence in gate tunable topological insulator (BixSb1-x)2Te3 nanoplates

Tingting Lia,b, Xudong Shia,b, Mingze Lia,b,*, Xuan P.A. Gaoc, Zhenhua Wanga,b,*, Zhidong Zhanga   

  1. aShenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China;
    bSchool of Materials Science and Engineering, University of Science and Technology of China, Hefei 230026, China;
    cDepartment of Physics, Case Western Reserve University, Cleveland, OH 44106, United States
  • Received:2024-10-18 Revised:2024-12-05 Accepted:2024-12-15 Published:2025-09-20 Online:2025-09-15
  • Contact: *E-mail addresses: mzli14s@imr.ac.cn (M. Li), zhwang@imr.ac.cn (Z. Wang)

Abstract: We report a systematic study on the transport properties of (Bi0.2Sb0.8)2Te3 and (Bi0.4Sb0.6)2Te3 nanoplates with a thickness of about 6 nm grown by chemical vapor deposition (CVD) on Si/SiO2 substrate. We achieve a significant ambipolar field effect in the two samples with different compositions by applying back-gate voltage, successfully tuning the Fermi level across the Dirac point of surface states. It is found that the Hall resistance exhibits strong non-linear behavior and magnetic field induced sign change of the slope when the Fermi level is near the Dirac point, indicating the coexistence of n-type and p-type carriers. Moreover, this coincides with the striking crossover from weak antilocalization (WAL) to linear magnetoresistance (LMR). These gate and temperature dependent magneto-transport studies provide a deeper insight into the nature of LMR and WAL in topological materials.

Key words: Topological insulators, Non-saturating linear magnetoresistance (LMR), Weak antilocalization (WAL), Nonlinear Hall resistance, Ambipolar field effect