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Effect of Tb Doping on Structural and Electrical Properties of BiFeO3 Thin Films Prepared by Sol–Gel Technique

Guohua Dong, Guoqiang Tan, Wenlong Liu, Ao Xia, Huijun Ren   

  1. Key Laboratory of Auxiliary Chemistry & Technology for Chemical Industry, Ministry of Education, Shaanxi University of Science & Technology, Xi’an 710021, China
  • Received:2013-03-28 Revised:2013-05-07 Online:2014-04-15 Published:2014-04-22
  • Contact: G. Tan
  • Supported by:

    National Natural Science Foundation of China (Grant No. 51172135); the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51002092); Research and Special Projects of the Education Department of Shaanxi Province (Grant No. 12JK0445); the Graduate Innovation Fund of Shaanxi University of Science and Technology (SUST-A04).

Abstract:

Bi1−xTbxFeO3 thin films were prepared on SnO2 (fluorine doped tin oxide) substrates by a sol–gel method. The structural and electrical properties of the BiFeO3 thin films were characterized and tested. The results indicated that the diffraction peak of the Tb-doped BiFeO3 films was shifted towards right as the doping amounts were increased. The structure was transformed from the rhombohedral to tetragonal/orthorhombic phase. The Bi0.89Tb0.11FeO3 thin film showed the well-developed PE loops, which enhanced remnant polarization (Pr = 88.05 μC/cm2) at room temperature. The dielectric constant and dielectric loss of Bi0.89Tb0.11FeO3 thin film at 100 kHz were 185 and 0.018, respectively. Furthermore, the Bi0.89Tb0.11FeO3 thin film showed a relatively low leakage current density of 2.07 × 10−5 A/cm2 at an applied electric field of 150 kV/cm. The X-ray photoelectron spectroscopy (XPS) spectra indicated that the presence of Fe2+ ions in the Bi0.89Tb0.11FeO3 thin film was less than that in the pure BiFeO3.

Key words: BiFeO3 thin films, Tb doping, Solegel method, Ferroelectric properties