J Mater Sci Technol ›› 2007, Vol. 23 ›› Issue (05): 595-598.

• Research Articles • Previous Articles     Next Articles

Densification Behavior of Nanocrystalline Mg2Si Compact in Hot-pressing

Wei XIONG, Xiaoying QIN, Li WANG   

  1. Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, China
  • Received:2006-04-14 Revised:2006-09-26 Online:2007-09-28 Published:2009-10-10
  • Contact: Xiaoying QIN

Abstract: Densification behavior of nanocrystalline Mg2Si (n-Mg2Si) with grain size about 30–50 nm was investigated by hot-pressing at 400℃. The results indicated that the densification process of n-Mg2Si exhibited three linear segments: p<0.3 GPa, 0.3 GPa1.2 GPa determined by Heckel formula, among which the third fast increasing segment in high pressure range p>1.2 GPa has seldom been reported in conventional coarse-grained polycrystalline materials. Nevertheless, in the whole pressure range (0.125–1.500 GPa) investigated the densification behavior of n-Mg2Si can be well described by a Kawakita formula p/C=(1/a)p+1/(ab) with constant a=0.452 being in good agreement with the initial porosity of the com

Key words: Nanocrystalline Mg2Si, Densification behavior, Hot-pressing