[1] S.Bae, J.LI, J.H.Judy and S.Zurn: Appl. Phys. Lett., 2000, 77, 3435. [2] R.David, J.Ebert, G.Miehe, M.Nathqlie, K.Michael and S.Branko: Thin Solid Films, 2004, 460, 256. [3] K.Wellock, J.Caro and B.J.Hickey: J. Maga. Mater., 1999, 198, 27. [4] A.Siritaratiwat, E.W.Hill, I.Shutt, J.M.Fallon and P.J.Grundy: Sensors and Actuators A: Phys., 2000, 81, 40. [5] G.R.Pattanaik, D.K.Pandya and S.C.Kashyap: Thin Solids Films, 2003, 433, 247. [6] G.Nabiyouni, W.Schwarzacher, Z.Rolik and I.Bakonyi: J. Magn. Mater., 2002, 253, 77. [7] J.M.Daughton: J. Magn. Mater., 1999, 192, 334. [8] J.Daughton, J.Brown, E.Chen, R.Beech, A.Pohm and W.Kude: IEEE Trans. Magn., 1994, 30, 4608. [9] C.Giebeler, D.J.Adelerhot, A.E.Vanzon and G.Schulz: Sensors and Actuators A: Phys., 2001, 91, 16. [10] C.P.Treutler and R.B.Gmbh: Sensors and Actuators A: Phys., 2001, 91, 2. [11] M.Angelakers, P.Poulopoulos, O.Valassiades, N.K.Flevaris, D.Niarchos and A.Nassiopoulou: Sensors and Actuators A: Phys., 2001, 91, 180. [12] G.A.Prinz: Sci., 1998, 282, 1660. [13] C.H.Tsang, R.E.Fantana, T.Lin, D.E.Heim, B.A.Gurney and M.L.Williams: IBM J. Res. Develop, 1998, 42, 103. [14] T.Thio, S.A.Solin, J.W.Bennett, D.R.Hines, M.Kawano, N.Oda and M.Sano: J. Crystal Growth, 1998, 184-185, 1293. [15] Yong WANG, Ming XU and Zhenhong MAI: Modern Phys. Lett., 2004, 18(9), 355. [16] J.W.Egelhoff, P.J.Chen, C.J.Powell, R.D.Mcmichael and M.D.Stiles: Progress in Surface Science, 2001, 67, 355. [17] Ming XU, Yong FAN, Guangming LUO and Zhenhong MAI: Phys. Lett. A, 2000, 272(4), 282. [18] Yuding HE, Shejun HU, Jian LI and Guangrong XIE: J. Mater. Sci. Technol., 2004, 20(2), 179. [19] P.M.Levy: Solid State Phys., 1994, 47, 367. [20] W.H.Butler and X.G.Zhang: J. Magn. Mater., 1995, 151, 354. [21] A.Vedyayev: Phys. Lett., 1994, A185, 117. |