Simulations of Temperature Field in HFCVD Diamond Films over Large Area

Abstract

Abstract: A three-dimensional model was developed to investigate the influence of various hot filaments parameters on substrate temperature fields that significantly affect the nucleation and growth of diamond films over large area by hot-filament chemical vapor deposition (HFCVD). Numerical simulated results indicated that substrate temperature varies as a function of hot filaments number, radius, temperature, emissivity, the distance between filaments, and the distance between substrate and filaments arrangement plane. When these filaments parameters were maintained at the optimal values, the homogeneous substrate temperature region of 76mm×76mm with the temperature fluctuation no more than 5% could be obtained by a 80mm×80mm hot filaments arrangement plane. Furthermore, the homogeneous region could be enlarged to 100mm×100mm under the condition of supplementary hot filaments with appropriate parameters. All of these calculations provided the basis for specially optimizing the hot filaments parameters to deposit uniform diamond film over large area by HFCVD.

Key words: HFCVD, Diamond film, Temperature field, Simulation

Aiying WANG, Chao SUN, Rongfang HUANG, Lishi WEN. Simulations of Temperature Field in HFCVD Diamond Films over Large Area[J]. J Mater Sci Technol, 2003, 19(01): 22-26.

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