J Mater Sci Technol ›› 2003, Vol. 19 ›› Issue (04): 334-336.

• Research Articles • Previous Articles     Next Articles

Surface Reaction of TiAl with Water Vapor and Oxygen

Yexin CHEN, Xiaojing WAN, Weixin XU   

  1. Institute of Materials, Shanghai University, Shanghai 200072, China...
  • Received:1900-01-01 Revised:1900-01-01 Online:2003-07-28 Published:2009-10-10
  • Contact: Yexin CHEN

Abstract: The interaction of water vapor and oxygen with TiAl-based alloy has been studied with Auger electron spectroscopy and X-ray photoelectron spectroscopy. The results indicate that both surface reactions initiate at a very short exposure (about 6×10(-7) Pa·s) and the oxides Al2O3 and TiO2 form in the surface reactions. In the oxidizing reaction, the water vapor reacts firstly with Al, and then reacts with Ti after certain exposure. The surface reaction of Al with water vapor may be responsible for the environmental embrittlement at room temperature in TiAl-based alloy.

Key words: Surface reaction, XPS, TiAl alloy