J. Mater. Sci. Technol. ›› 2026, Vol. 254: 29-44.DOI: 10.1016/j.jmst.2025.08.010

• Research Article • Previous Articles     Next Articles

Tailoring microstructure in K-doped SiO2 coatings for enhanced densification and oxidation resistance

Hao-Jie Yana, Xin-Yu Yea, Xian-Ze Mengb, Hao Lia, Hui-Song Hua, Tao Fana, Hui-Jun Liuc, Qing-Qing Suna, Lian-Kui Wua,*, Fa-He Caoa,*   

  1. aSchool of Materials, Sun Yat-sen University, Shenzhen 518107, China;
    bInstitute of Nuclear Energy Safety Technology, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China;
    cSongshan Lake Materials Laboratory, Dongguan 523808, China
  • Received:2025-06-15 Revised:2025-07-26 Accepted:2025-08-06 Online:2026-05-08
  • Contact: *E-mail addresses: wulk5@mail.sysu.edu.cn (L.-K. Wu), caofh5@mail.sysu.edu.cn (F.-H. Cao)

Abstract: This study developed K-doped SiO2 coatings on TiAl alloys to enhance oxidation resistance by controlling phase structures. The results indicate that K can promote the densification of the SiO2 coating and reduce the oxidation mass gain of the pure SiO2 coating by 89.1 %. Increasing K content can reduce the precipitation of cristobalite and suppress crack formation, therefore decreasing direct contact between oxygen and substrate. On the other hand, although the amorphous phase with K improves densification, it compromises stability due to lower diffusion barrier (5.743 eV) and stronger oxygen adsorption energy (-0.698 eV) compared to cristobalite SiO2 (6.057 and -0.249 eV). Thus, under the premise of no cracks, keeping a certain amount of cristobalite is beneficial to strengthening the structure of the oxide scale.

Key words: High temperature oxidation, Densification capability, SiO2 coating, Cristobalite, Potassium modification