J. Mater. Sci. Technol. ›› 2025, Vol. 237: 83-96.DOI: 10.1016/j.jmst.2025.02.050
• Research Article • Previous Articles Next Articles
Tongxuan Jiaa, Shilv Lia, Jiulong Zhua, Xudong Ana, Ning Ronga, Yeping Linb, Zhixiao Liua, Huiqiu Dengb,c, Wangyu Hua, Tengfei Yanga,c,*
Received:2024-11-04
Revised:2025-01-08
Accepted:2025-02-10
Published:2025-12-01
Online:2026-01-08
Contact:
*College of Materials Science and Engineering, Hunan University, Changsha 410082, China. E-mail address: Tongxuan Jia, Shilv Li, Jiulong Zhu, Xudong An, Ning Rong, Yeping Lin, Zhixiao Liu, Huiqiu Deng, Wangyu Hu, Tengfei Yang. Molecular dynamics simulations of one-dimensional migration of vacancy loops in FCC metals[J]. J. Mater. Sci. Technol., 2025, 237: 83-96.
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