J. Mater. Sci. Technol. ›› 2025, Vol. 235: 122-132.DOI: 10.1016/j.jmst.2025.03.014

• Research Article • Previous Articles     Next Articles

Mesoporous hollow silica with controlled particle size for optimizing dielectric properties and coefficient of thermal expansion of polyimide packaging materials

Tianqi Houa,b,1, Xia Liuc,1, Junwen Rend,1, Xianzhen Xub, Di Lana,*, Siyuan Zhange, Hua Guoe, Guangrong Wuf,*, Zirui Jiab,*, Guanglei Wub,*   

  1. aSchool of Automotive Materials, Hubei University of Automotive Technology, Shiyan 442002, China;
    bCollege of Materials Science and Engineering, Qingdao University, Qingdao 266071, China;
    cShandong Institute of Nonmetallic Materials, Jinan 250031, China;
    dCollege of Electrical Engineering, Sichuan University, Chengdu 610065, China;
    eSchool of Chemistry and Chemical Engineering, Northwestern Polytechnical University, Xi'an 710072, China;
    fQingdao Hengxing University of Science and Technology, Qingdao 266100, China
  • Received:2025-02-20 Revised:2025-03-21 Accepted:2025-03-26 Published:2025-11-10 Online:2025-12-19
  • Contact: *E-mail addresses: landi@mail.nwpu.edu.cn (D. Lan), guangrong0913@163.com (G. Wu), jiazirui@qdu.edu.cn (Z. Jia), wuguanglei@mail.xjtu.edu.cn, wuguanglei@qdu.edu.cn (G. Wu).
  • About author:1These authors contributed equally to this work.

Abstract: Demand for high-performance power devices continues to grow with the continuous development of power electronics and high-end field applications. Although packaging materials based on epoxy resins and silica gels have been widely developed, higher operating temperatures and operating voltages are still critical to the performance of power devices. Here, a composite film containing functionalized mesoporous hollow silica particles (MH-SiO2) and polyimide (PI) was prepared by a template method and layer-by-layer coating strategy to address the current bottlenecks in packaging material development. The electrical breakdown strength of the prepared PI/SiO2 composite film was 323.41 kV/mm, while the mass fraction of MH-SiO2 was only 5 %. This indicates that the mesoporous structure can effectively inhibit electron collisions with nano-restricted domains. The simulation results also indicate that the size variation of inorganic fillers and the interaction of organic/inorganic heterogeneous interfaces are the main reasons affecting the performance of the composites. Meanwhile, the PI/SiO2 composite films achieved other properties required for practical applications, such as matched coefficient of thermal expansion (CTE) (23.5 ppm/°C), excellent thermal stability (T5 % = 559.0 °C) and low dielectric constant (2.27@1 M Hz). These results highlight the great potential of inorganic phase-specific structural designs for the preparation of high-performance power device packaging materials.

Key words: Mesoporous hollow silica, Polyimide, Coefficient of thermal expansion, Dielectric properties, Breakdown strength