J Mater Sci Technol ›› 1995, Vol. 11 ›› Issue (6): 426-428.

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<100> Textured Diamond Film on Silicon Grown by Hot Filament Chemical Vapor Deposition

Xuanxiong ZHANG; Tiansheng SHI and Xikang ZHANG (State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy,Chinese Academy of Sciences, Shanghai, 200050, China)   

  • Received:1995-11-28 Revised:1995-11-28 Online:1995-11-28 Published:2009-10-10

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Abstract: The <100> textured growth of diamond film on HF eroded silicon wafer has been studied by HFCVD. The evolution of grain size and sudece morphology vs deposition time is presented and the <100> textured thick diamond film (80μm) with smooth surface, desirable for practical application in many fields is obtained

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