J Mater Sci Technol ›› 1998, Vol. 14 ›› Issue (2): 139-142.

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Magnetism and Its Dependence on Annealing Temperature for Sputtered Co/Cu Multilayers

Ruwei GAO ; Yihua LIU; Shishen YAN Deheng ZHANG and Lin ZHANG(Dept. of Physics, Shandong University, Jinan 250100, China)   

  • Received:1998-03-28 Revised:1998-03-28 Online:1998-03-28 Published:2009-10-10

Abstract: Magnetism and its dependence on annealing temperature for r.f. sputtered Co/Cu multilayers have been investigated. It was found that the easy magnetization axes of the films are paralIel to the substrate and the magnetic properties of both as-sputtered and annealed multilayers are isotropic in the film plane. The coercive field Hc is 4.8 kA/m and the ratio of remanence-tosaturation magnetization Mi/M is about 0.73 for as-sputtered samples. Both Hc and Mr/Ms increase with increasing annealing temperatures, especially when annealing temperatures are higher than 400℃. These experimental results can be interpreted using the ferromagnetic exchange coupling and the pinning theory of the coercivity