J Mater Sci Technol ›› 2004, Vol. 20 ›› Issue (04): 472-474.

• Research Articles • Previous Articles     Next Articles

Responding Depth of Photocatalytic Activity of TiO2 Self-assembled Films

Weichang HAO, Feng PAN, Tianmin WANG, Shukai ZHENG   

  1. Center of Materials Physics and Chemistry, School of Science, Beijing University of Aeronautics and Astronautics, Beijing 100083, China;Department of Materials Science, Lanzhou University, Lanzhou 730000, China
  • Received:1900-01-01 Revised:1900-01-01 Online:2004-07-28 Published:2009-10-10
  • Contact: Tianmin WANG

Abstract: The electrostatically self-assembly method is getting strategically important to prepare multilayer thin films. With careful choice of component materials, this method should allow for the preparation of multilayer thin films with a variety of excellent technological properties. TiO2/PSS multilayer thin films with ordered structure were prepared by electrostatic self-assembly method. UV-Vis-NIR spectrophotometer, X-ray photoelectron spectroscopy (XPS), and atom force microscopy (AFM) were used to characterize the structure and performance of the multilayer films. Because electrostatically self-assembly method allows molecular-level control over the film composition and thickness, this paper studied the responding depth of photocatalytic activity of TiO2 self-assembled films in detail.

Key words: Responding depth, Titanium dioxide, Photocatalytic activity, Electrostatically self-assembly