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J Mater Sci Technol  2004, Vol. 20 Issue (04): 472-474    DOI:
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Responding Depth of Photocatalytic Activity of TiO2 Self-assembled Films
Weichang HAO, Feng PAN, Tianmin WANG, Shukai ZHENG
Center of Materials Physics and Chemistry, School of Science, Beijing University of Aeronautics and Astronautics, Beijing 100083, China;Department of Materials Science, Lanzhou University, Lanzhou 730000, China
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Abstract  The electrostatically self-assembly method is getting strategically important to prepare multilayer thin films. With careful choice of component materials, this method should allow for the preparation of multilayer thin films with a variety of excellent technological properties. TiO2/PSS multilayer thin films with ordered structure were prepared by electrostatic self-assembly method. UV-Vis-NIR spectrophotometer, X-ray photoelectron spectroscopy (XPS), and atom force microscopy (AFM) were used to characterize the structure and performance of the multilayer films. Because electrostatically self-assembly method allows molecular-level control over the film composition and thickness, this paper studied the responding depth of photocatalytic activity of TiO2 self-assembled films in detail.
Key words:  Responding depth      Titanium dioxide      Photocatalytic activity      Electrostatically self-assembly      
Received:  01 January 1900     
Corresponding Authors:  Tianmin WANG     E-mail:  wtm@buaa.edu.cn

Cite this article: 

Weichang HAO, Feng PAN, Tianmin WANG, Shukai ZHENG. Responding Depth of Photocatalytic Activity of TiO2 Self-assembled Films. J Mater Sci Technol, 2004, 20(04): 472-474.

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