J. Mater. Sci. Technol. ›› 2010, Vol. 26 ›› Issue (11): 961-966.

• Research Articles •    下一篇

The Effect of Substrate and Annealing Temperatures on Mechanical Properties of Ti-rich NiTi films

Atul Kumar1,SamirVKamat1,SudhirKSharma2,SandipBysakh3,SMohan2   

  1. 1. Defence Metallurgical Research Laboratory
    2. Indian Institute of Science
    3. Central Glass and Ceramic Research Institute
  • 收稿日期:2009-07-01 修回日期:2010-03-23 出版日期:2010-11-30 发布日期:2010-11-22
  • 通讯作者: SamirVKamat
  • 基金资助:

    DRDO

Effect of Substrate and Annealing Temperatures on Mechanical Properties of Ti-rich NiTi Films

A. Kumar1), S.K. Sharma2), S. Bysakh3), S.V. Kamat1), S. Mohan2)   

  1. 1) Defence Metallurgical Research Laboratory, Hyderabad 500058, India
    2) Department of Instrumentation, Indian Institute of Science, Bangalore 560012, India
    3) Central Glass and Ceramics Research Institute, Kolkata 700032, India
  • Received:2009-07-01 Revised:2010-03-23 Online:2010-11-30 Published:2010-11-22
  • Contact: S.V. Kamat

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摘要： The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films deposited on Si (100) substrates by DC magnetron sputtering was studied using nanoindentation. NiTi films were deposited at two substrate temperatures viz. 300 and 400°C. NiTi films deposited at 300°C were annealed for four hours at four different temperatures, i.e. 300, 400, 500 and 600°C whereas films deposited at 400°C were annealed for four hours at three different temperatures, i.e. 400, 500 and 600°C. The elastic modulus and hardness of the films were found to be the same in the as deposited as well as annealed conditions for both substrate temperatures. For a given substrate temperature, the hardness and elastic modulus were found to remain unchanged as long as the films were amorphous. However, both elastic modulus and hardness showed an increase with increase in annealing temperature as the films become crystalline. The results were explained on the basis of the change in microstructure of the film with change in annealing temperature.

关键词: NiTi thin film, Annealing, Nanoindentation

Abstract: The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films deposited on Si (100) substrates by DC magnetron sputtering was studied by nanoindentation. NiTi films were deposited at two substrate temperatures viz. 300 and 400°C. NiTi films deposited at 300°C were annealed for 4 h at four different temperatures, i.e. 300, 400, 500 and 600°C whereas films deposited at 400°C were annealed for 4 h at three different temperatures, i.e. 400, 500 and 600°C. The elastic modulus and hardness of the films were found to be the same in the as-deposited as well as annealed conditions for both substrate temperatures. For a given substrate temperature, the hardness and elastic modulus were found to remain unchanged as long as the films were amorphous. However, both elastic modulus and hardness showed  an increase with increasing annealing temperature as the films become crystalline. The results were explained on the basis of the change in microstructure of the film with change in annealing temperature.

Key words: NiTi thin film, Annealing, Nanoindentation