J. Mater. Sci. Technol. ›› 2012, Vol. 28 ›› Issue (6): 512-523.

• Reviews • 上一篇    下一篇

Structural, wettability and optical investigation of titanium oxynitride coatings : Effect of various sputtering parameters

Sushant K. Rawal1,Amit Kumar Chawla1,R. Jayaganthan2,Ramesh Chandra1   

  1. 1. IIT Roorkee
    2. Indian Institute of Technology Roorkee
  • 收稿日期:2011-08-08 修回日期:2012-02-06 出版日期:2012-06-28 发布日期:2012-07-02
  • 通讯作者: Ramesh Chandra

Structural, Wettability and Optical Investigation of Titanium Oxynitride Coatings: Effect of Various Sputtering Parameters

Sushant K Rawal1,2,5), Amit Kumar Chawla3), R. Jayaganthan1,4), Ramesh Chandra2)   

  1. 1) Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee-247667, India
    2) Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee-247667, India
    3) Department of Physics, University of Petroleum and Energy Studies, Dehradun-48007, India
    4) Department of Metallurgical and Materials Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, India
    5) Department of Mechanical Engineering, Charotar University of Science and Technology, Changa 388421, India
  • Received:2011-08-08 Revised:2012-02-06 Online:2012-06-28 Published:2012-07-02
  • Contact: Ramesh Chandra
  • Supported by:

    bthe Council of Scientific and Industrial Research (CSIR) (Grant No. 03(1148)/09/EMR-II) and the Defence Research and Development Organisation (DRDO) (Grant No. ERIP/ER/0800354/M/011125)

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摘要： The objective of the present work is to investigate the effect of various sputtering parameters such as nitrogen flow rate, deposition time and sputtering pressure on structural, wettability and optical properties of titanium oxynitride films deposited on glass substrate by reactive magnetron sputtering. The X-ray diffraction graphs of titanium oxynitride films shows evolution of various textures of TiOxNy and TiN phases with increase in nitrogen flow rate and deposition time but increase in sputtering pressure from 4.0 to 8.0Pa results in decline of various textures observed for TiOxNy and TiN phases. The stress and strain calculated by sin2Ψ method are compressive; it decreases with increase in nitrogen flow rate from 55 to 100sccm and increases with raise in deposition time from 80 to 140 minutes due to atomic penning effect and increase in thickness of the deposited films. The titanium oxynitride films has contact angle values above 90? indicating films are hydrophobic and maximum contact angle of 109.1° is observed at deposition time of 140 minutes. This water repellent property can add value to potential protective, wear and corrosion resistant application of titanium oxynitride films. The band gap decreases from 1.98-1.83eV as nitrogen flow rate is increased from 55 to 100sccm; it decreases from 1.93-1.79eV as deposition time is increased from 80 to 140 minutes as more nitrogen incorporation result in higher negative potential of valence band N 2p orbital. But it increases from 2.26-2.34eV for titanium oxynitride films as sputtering pressure increases from 4.0 to 8.0Pa.

Abstract: The objective of the present work is to investigate the effect of various sputtering parameters such as nitrogen flow rate, deposition time and sputtering pressure on structural, wettability and optical properties of titanium oxynitride films deposited on glass substrate by reactive magnetron sputtering. The X-ray diffraction graphs of titanium oxynitride films show evolution of various textures of TiOxNy and TiN phases with increasing nitrogen flow rate and deposition time, but an increase in sputtering pressure from 4.0 to 8.0 Pa results in decline of various textures observed for TiOxNy and TiN phases. The stress and strain calculated by sin2Ψmethod are compressive, which decrease with increasing nitrogen flow rate from 55 to 100 sccm (standard cubic centimeter per minute) and increase with increasing deposition time from 80 to 140 min due to atomic penning effect and increasing thickness of the deposited films. The titanium oxynitride films have contact angle values above 90 deg., indicating that films are hydrophobic. The maximum contact angle of 109.1 deg. is observed at deposition time of 140 min. This water repellent property can add value to potential protective, wear and corrosion resistant application of titanium oxynitride films. The band gap decreases from 1.98 to 1.83 eV as nitrogen flow rate is increased from 55 to 100 sccm; it decreases from 1.93 to 1.79 eV as deposition time is increased from 80 to 140 min as more nitrogen incorporation results in higher negative potential of valence band N2p orbital. But it increases from 2.26 to 2.34 eV for titanium oxynitride films as sputtering pressure increases from 4.0 to 8.0 Pa.

Key words: Titanium oxynitride, Sputtering parameters, Contact angle, Optical properties