J. Mater. Sci. Technol. ›› 2009, Vol. 25 ›› Issue (01): 135-140.
Pulsed-Laser Annealing of NiTi Shape Memory Alloy Thin Film
S.K. Sadrnezhaad
- 1) Materials and Energy Research Center; P.O. Box 14155-4777; Tehran; Iran
2) Department of Materials Science and Engineering; Sharif University of Technology; P.O. Box 1156-9466; Tehran; Iran
3) Department of Materials Science and Engineering; Tarbiat Modarres University; P.O. Box 14115-143; Tehran; Iran
Pulsed-Laser Annealing of NiTi Shape Memory Alloy Thin Film
S.K. Sadrnezhaad1;2)†, E. Rezvani1), S. Sanjabi1;3) and A.A. Ziaei Moayed2)
- 1) Materials and Energy Research Center, P.O. Box 14155-4777, Tehran, Iran
2) Department of Materials Science and Engineering, Sharif University of Technology, P.O. Box 1156-9466, Tehran, Iran
3) Department of Materials Science and Engineering, Tarbiat Modarres University, P.O. Box 14115-143, Tehran, Iran
摘要：
Local annealing of amorphous NiTi thin films was performed by using an Nd:YAG 1064 nm wavelength pulsed laser beam. Raw samples produced by simultaneous sputter deposition from elemental Ni and Ti targets onto unheated Si (100) and Silica (111) substrates were used for annealing. Delicate treatment with 15.92 W/mm2 power density resulted in crystallization of small spots; while 16.52 and 17.51 W/mm2 power densities caused ablation of the amorphous layer. Optical microscopy, scanning electron microscopy, X-ray diffraction and atomic force microscopy were performed to characterize the microstructure and surface morphology of the amorphous/crystallized spot patterns.