Characterization of Microstructural and Morphological Properties in As-deposited Ta/NiFe/IrMn/CoFe/Ta Multilayer System

Öksüzoğlu Ramis Mustafa^1,^*, Sarac Umut², Yıldırım Mustafa¹, Çınar Hakan¹

Fig. 5. AFM topographic images of S1 samples with the thickness of the NiFe seed layer: a 2 nm, b 8 nm scan scale of 1 μm × 1 μm.