Characterization of Microstructural and Morphological Properties in As-deposited Ta/NiFe/IrMn/CoFe/Ta Multilayer System
Öksüzoğlu Ramis Mustafa1,*, Sarac Umut2, Yıldırım Mustafa1, Çınar Hakan1
Fig. 2. Evolution of the integral intensity and the FWHM values of the fcc IrMn 111 peak, a as a function of the thickness of the NiFe seed, b Ta buffer layers. All lines are guide for the eye.