Characterization of Microstructural and Morphological Properties in As-deposited Ta/NiFe/IrMn/CoFe/Ta Multilayer System

Öksüzoğlu Ramis Mustafa^1,^*, Sarac Umut², Yıldırım Mustafa¹, Çınar Hakan¹

Fig. 1. XRD patterns of a Ta 5 nmNiFe t s = 2–10 nmIrMn10 nmCoFe 2 nmTa 5 nm and b Ta t b = 2–10 nmNiFe 8 nmIrMn 10 nmCoFe 2 nmTa 5 nm samples as a function of the NiFe seed and Ta buffer layer thicknesses.