Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100)
She Xiaofeng, Wang Hongtao* 
Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100) |
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She Xiaofeng, Wang Hongtao
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| Fig. 3. a Cross-sectional TEM image and b HAADF-STEM image of the annealed 900 °C, 1 min La 1.1 Al 0.9 O 3 film on Si, c HRTEM image of the interfacial layer, d low magnification TEM image. |
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