Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100)
She Xiaofeng, Wang Hongtao* 
Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100) |
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She Xiaofeng, Wang Hongtao
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| Fig. 2. a Cross-sectional TEM image of Al 2 O 3 Si sample after annealing at 450 °C; Cross-sectional TEM images of Al 2 O 3 Si samples after annealing at b 600 °C and c 900 °C. |
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