Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100)
She Xiaofeng, Wang Hongtao* 
Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100) |
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She Xiaofeng, Wang Hongtao
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| Fig. 9. Cross-sectional TEM image of WNLa 1.1 Al 0.9 O 3 Si sample after annealing at 800 °C. |
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