Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100)
She Xiaofeng, Wang Hongtao* 
Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100) |
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She Xiaofeng, Wang Hongtao
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| Fig. 5. a Plane-view TEM image of the film annealed at 900 °C, b corresponding SAED pattern, c plane-view TEM image of the sample annealed at 1000 °C for 10 s in the N 2 environment. The inset is the corresponding SAED pattern of Fig. 5 c. |
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