Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100)
She Xiaofeng, Wang Hongtao* 
Thermal Stability of ALD Lanthanum Aluminate Thin Films on Si (100) |
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She Xiaofeng, Wang Hongtao
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| Fig. 4. XRD patterns of the sample the sample annealed at 1000 °C for 10 s in the N 2 environment and the bare substrate. |
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