[1] S.P.Murarka: Mater. Sci. Eng., 1997, R19, 87. [2] Y.Shacham-Diamand and S.Lopatin: Electrochim. Acta, 1999, 44, 3639. [3] D.Edelstein, J.Heidenreich, R.Goldblatt, W.Cote, C.Uzoh, N.Lusting, P.Roper, T.McDevitt, W.Motsiff, A.Simon, J.Dukovic, R.Wachinik, H.Rathore, R.Schulz, L.Su, S.Luce and J.Slattery: Technical Digest of International Electron Devices Meeting (IEDM 1997), Dec. 7-10, 1997, Washington D.C., IEEE, 1997, 773. [4] S.P.Murarka, R.J.Gutmann, A.E.Kaloyeros and W.A.Lanford: Thin Solid Films, 1993, 236, 257. [5] X.W.Lin and D.Pramanik: Solid State Technol., 1998, 10, 63. [6] Y.Shacham-Diamand and V.M.Dubin: Microelectron. Eng., 1997, 33, 47. [7] Y.Shacham-Diamand, Y.Sverdlov and N.Petrov: J. Electrochem. Soc., 2001, 148, C161. [8] A.Kohn, M.Eizenberg, Y.Shacham-Diamand, B.Israel and Y.Sverdlov: Microelectron. Eng., 2001, 55, 297. [9] A.Kohn, M.Eizenberg, Y.Shacham-Diamand and Y.Sverdlov: Mater. Sci. Eng., 2001, 212, 18. [10] A.Kohn, M.Eizenberg, Y.Shacham-Diamand and Y.Sverdlov: J. Appl. Phys., 2002, 92, 5508. [11] C.K.Hu, L.Gignac, R.Rosenberg, E.Liniger, J.Rubino and C.Sambucetti: Appl. Phys. Lett., 2002, 81, 1782. [12] A.Kohn, M.Eizenberg and Y.Shacham-Diamand: Appl. Surf. Sci., 2003, 212, 367. [13] C.K.Hu, L.Gignac, R.Rosenberg, E.Liniger, J.Rubino, C.Sambucetti, A.Stamper, A.Domenicucci and X.Chen: Microelectron. Eng., 2003, 70, 406. [14] Y.Sverdlov and Y.Shacham-Diamand: Microelectron. Eng., 2003, 70, 512. [15] A.Kohn, M.Eizenberg and Y.Shacham-Diamand: J. Appl. Phys., 2003, 94, 3810. [16] Y.Shacham-Diamand and Y.Sverdlov: Microelectron. Eng., 2000, 50, 525. [17] S.Noda, R.Hirai, H.Komiyama and Y.Shimogaki: Jpn. J. Appl. Phys., 2004, 43, 6001. [18] M.Datta: Electrochim. Acta, 2003, 48, 2975. [19] J.Barmann, Ch.Kaufmann, M.Rennau, Th.Werner and T.Gessner: Microelectron. Eng., 1997, 33, 283. [20] H.Schmalzried: Solid State Reactions, Academic Press, New York, 1974, 87-89. [21] E.L.Cussler: Diffusion Mass Transfer in Fluid Systems, Cambridge University Press, London, 1984, 138. [22] X.H.Chen, R.Hirai, S.Noda and Y.Shimogaki: The 65th Applied Physics Symposium, Sendai, 2004, 713. |