J Mater Sci Technol ›› 2003, Vol. 19 ›› Issue (Supl.): 97-98.

• Research Articles • Previous Articles     Next Articles

Simplification of the Plasma Load of Negative-Pulse-Bias Source Used in Arc Ion Plating

Dong QI, Ninghui WANG, Guoqiang LIN, Zhenfeng DING   

  1. Department of Electrical and Electronics Engineering, Dalian University of Technology, Dalian 116024, China
  • Received:1900-01-01 Revised:1900-01-01 Online:2003-12-28 Published:2009-10-10
  • Contact: Dong QI

Abstract: Based on the voltage and current fluctuating phenomenon in the arc plasma load under the negative-pulse-bias, using the plasma physics theory and analysis of computer simulation expatiates that the nature of plasma load in vacuum arc plasma is a capacitance load caused by plasma sheath and can be simplified as a parallel unit composed of a capacitor and a resistor, which have exact and quantitative description in the plasma physics theory. It concludes the values of capacitance and resistance are thousand PF and hundred ohm from the result of simulation and experiment. As a result, this has solved the key theoretical issues for the design of negative-pulse-bias source specifically used for vacuum arc ion plating.

Key words: Vacuum arc ion plating, Negative-pulse-bias, Plasma load